TCAD simulation is very important for DUV lithography process development and control. Traditional lithography process engineering has relied on short-loop and pilot-lot experiments to understand the effects of particular process control factors. However, experiments are very expensive, and the complexity of lithographic patterns and processes is such that we must often resort to computational ...

The processing techniques for micro and nano devices fabrication can be divided into two groups. On one hand, there are the techniques that allow the modification of a given substrate, e.g. ionic implantation, metallization, etching and thermal processes to either grow or deposit insulator layers. On the other hand, there are the processes that allow a pattern transfer of the designs onto the s...

In this paper, we review the current development of stencil lithography for scalable microand nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-area microand nanopatterning. Then we review the progress of using rigid membranes such as SiNx and Si as stencil masks as well as stacking layers. We a...

Inverse lithography technique (ILT) is significant to reduce the feature size of ArF optical lithography due to its strong ability to overcome the optical proximity effect. A critical issue for inverse lithography is the complex curvilinear patterns produced, which are very costly to write due to the large number of shots needed with the current variable shape beam (VSB) writers. In this paper,...

In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the ...

Celor doua Doamne din viata mea: mamaie si mama 7 Preface This thesis discusses some of the challenges of optical design for Extreme Ultraviolet (EUV) mirror systems and illustrates novel design techniques and their application to, preponderantly, EUV systems and, in addition, some Deep Ultraviolet (DUV) lithographic objectives. The main added value of this thesis is the fact that it shows how ...

In order to manufacture large-scale photonic devices of various dimensions at a low cost, a number of patterning techniques have been developed. Nanoimprint lithography is among the most promising given its unique advantages, such as high resolution, fast processing speed, high throughput, compatibility with diverse materials, and low cost. This review covers various aspects of nanoimprint lith...