In this work, the titanium nitride (TiN) thin films were prepared on Si-wafers by using DC reactive magnetron sputtering from a pure target. The influence of N2 flow rates, in range 1.0-4.0 sccm, as-deposited TiN film’s structure was characterized several techniques. (i) crystal structures studied GI-XRD. (ii) thicknesses, microstructures, and surface morphologies analyzed FE-SEM. (iii) element...

This paper describes the microfabrication and electrical characterization of aluminum-coated superconducting through-silicon vias (TSVs) with sharp transition above 1 K. The was achieved by means fully conformal void-free DC-sputtering TSVs Al, is here demonstrated in up to $500~\mu \text{m}$ -deep vias. Full conformality Al sputtering made possible shaping a tailored hourglass profile, which a...

The present thesis addresses two research areas related to film growth in a highly ionized magnetron sputtering system: plasma characterization, and thin film growth and analysis. The deposition technique used is called high power pulsed magnetron sputtering (HPPMS). Characteristic for this technique are high energy pulses (a few Joules) of length 50-100 μs that are applied to the target (catho...