نتایج جستجو برای: cuf2 deposition

تعداد نتایج: 92659  

2005
M. Gruber

In planar-integrated free-space optics (PIFSO) [1] the systems approach of which is shown schematically in Abb.1 signals may have to bounce up and down a considerable number of times inside a planar transparent substrate to reach their destinations. To obtain a high coupling efficiency it is therefore mandatory to cover the optical elements with a high-reflectance coating. Thin metal films are ...

2012
Henrik Pedersen Mikhail Chubarov Hans Högberg Jens Jensen Anne Henry

Journal: :SIAM Journal of Applied Mathematics 2003
Christian A. Ringhofer Matthias K. Gobbert

We present a homogenization technique for rarefied gas flow over a microstructured surface consisting of patterns of periodic features. The length scale of the model domain is comparable to the mean free path of the molecules, while the scale of the surface patterns is much smaller. The flow is modeled by a system of linear Boltzmann equations with a diffusive boundary condition at the patterne...

1996
I. A. Shareef G. W. Rubloff W. N. Gill

Deposition rates, wet etch rates, and thickness uniformity experiments were performed using O3/TEOS thermal chemical-vapor deposition. Our results for oxide deposition show optimum process window around 200 Torr for producing films of good quality ~uniformity and material properties!. This is in excellent agreement with the modeling predictions over a broad range of pressure ~100–600 Torr! and ...

2007
H. Xia L. Lu Y. S. Meng G. Ceder

Phase Transitions and High-Voltage Electrochemical Behavior of LiCoO2 Thin Films Grown by Pulsed Laser Deposition H. Xia, L. Lu, Y. S. Meng, and G. Ceder* Advanced Materials for Microand Nano-System, Singapore-MIT Alliance, Singapore 117576 Department of Mechanical Engineering, National University of Singapore, Singapore 117576 Department of Materials Science and Engineering, Massachusetts Inst...

Journal: :Microelectronics Reliability 2007
Stefan Holzer Alireza Sheikholeslami Markus Karner Tibor Grasser Siegfried Selberherr

We present a comparison of models describing the pyrolytic deposition of SiO2 with a low pressure chemical vapor deposition process. In order to meet industrial simulation requirements, e.g. accuracy and fast delivery of results, we present an overview of established and new models, their use within TCAD applications, and their best results which have been obtained by calibrations according to ...

2005
Titta Aaltonen Markku Leskelä Mikko Ritala

3 Preface 4 List of publications 5 List of symbols and abbreviations 6

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