In this work, we report on the synthesis and the electrical properties of ZnO nanoparticles, which differ in their organic shell. The introduction of a 2-ethylhexanoate shell instead of a common acetate shell has an impact on the accessible size of the ZnO nanoparticles and changes the electrical properties of thin films in transistors. While acetate covered ZnO particles behave as a semiconduc...

Al-doped ZnO thin films were prepared on the (0001) sapphire (c-Al2O3) substrates by atomic layer deposition (ALD) using alternating pulses of Zn(C2H5)2, Al(CH3)3 and H2O precursors and post-deposition high-temperature annealing. Photoluminescence (PL) spectroscopy showed that the threshold of stimulated emission decreases with increasing Al concentration, from 49.2 kW/cm of the ZnO film to 12....

Atomic layer deposition (ALD) is a technique that uses a cyclical exposure and purging of chemical precursors to create thin films. ALD offers a high degree of control over the thickness and composition of the films. The technique is generally used for binary compounds such as oxide and nitrides. ZnO is grown by ALD as a transparent conductive oxide for photovoltaic and optoelectronic applicati...

The improvement of the physical properties of Indium Tin Oxide (ITO) layers is quite advantageous in photovoltaic applications. In this study the ITO film is deposited by RF sputtering onto p-type crystalline silicon (c-Si) with (100) orientation, multicrystalline silicon (mc-Si), and glass substrates coated with ZnO and annealed in vacuum furnace at 400°C. Electrical, optical, structural a...

7 A systematic study for the optimization of the deposition process of ZnO thin films grown by 8 DC magnetron sputtering at room temperature was carried out using different oxygen partial 9 pressures and deposition times. We have established a correlation between the oxygen partial 10 pressure, the chemical composition and the crystalline structure of the films. 11 Stoichiometric and highly ori...

ZnO nanoparticles and graphene oxide (GO) thin film were deposited on gold interdigital electrodes (IDEs) in sequence via simple spraying process, which was further restored to ZnO/reduced graphene oxide (rGO) bilayer thin film by the thermal reduction treatment and employed for ammonia (NH3) detection at room temperature. rGO was identified by UV-vis absorption spectra and X-ray photoelectron ...

Zeonor plastics are highly versatile due to exceptional optical and mechanical properties which make them the choice material in many novel applications. For potential use in flexible transparent optoelectronic applications, we have investigated Zeonor plastics as flexible substrates for the deposition of highly transparent ZnO and AZO thin films. Films were prepared by pulsed laser deposition ...

The maximum conductivity achievable in Al-doped ZnO thin films prepared by atomic layer deposition (ALD) is limited by the low doping efficiency of Al. To better understand the limiting factors for the doping efficiency, the three-dimensional distribution of Al atoms in the ZnO host material matrix has been examined on the atomic scale using a combination of high-resolution transmission electro...

A room temperature cathodic arc deposition technique is used to produce high-mobility ZnO thin films for low voltage thin-film transistors (TFTs) and digital logic inverters. All-oxide, fully transparent devices are fabricated on alkali-free glass and flexible polyimide foil, exhibiting high performance. This provides a practical materials platform for the low-temperature fabrication of all-oxi...

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