نتایج جستجو برای: total etch

تعداد نتایج: 803502  

2007
p. kumar s. kanakaraju d. l. devoe

A study of AlxGa1−xAs as a sacrificial film for surface micromachining is presented. AlxGa1−xAs etch rate and selectivity are measured over a range of aluminum mole fractions and HF etchant concentrations during the release of structural features up to 500 μm in width. The etch process is found to be diffusion limited, with an inverse power law relationship between etch depth and etch rate. Exc...

Journal: :Journal of oral science 2014
Masashi Miyazaki Akimasa Tsujimoto Keishi Tsubota Toshiki Takamizawa Hiroyasu Kurokawa Jeffrey A Platt

Improvements in dentin bonding systems have influenced modern restorative dentistry. The desire for minimal invasiveness has resulted in more-conservative cavity design, which basically relies on the effectiveness of current dentin bonding systems. Interaction of adhesives with enamel and dentin is based on two systems, commonly described as etch-and-rinse and self-etch. Priming and bonding age...

2014
Adrian Adalberto Garay Su Min Hwang Chee Won Chung

The inductively coupled plasma etching characteristics of Co2MnSi thin films patterned using a TiN hard mask were investigated by the addition of CH3OH to Ar gas. As the CH3OH concentration increased, the etch rates of Co2MnSi magnetic thin films and TiN hard mask decreased, but the etch profile improved. The effects of rf power, dc-bias voltage and gas pressure on the etch rate and etch profil...

Maleknejad, Fatemeh, Moosavi, Horiyeh,

  Factors contributing to the incompatibility between new adhesive systems and various composite resin restorations     Dr. F. Maleknejad* - Dr. H. Moosavi**  *- Associate Professor of Operative Dentistry Dept. - Faculty of Dentistry – Mashhad University of Medical Sciences.  **- Assistant Professor of Operative Dentistry Dept. - Faculty of Dentistry – Mashhad University of Medical Sciences.   ...

Ali Heidari, Ali Nozari, Azade Rafiee,

Introdouction: Esthetic demands of patients have led to the introduction of tooth-colored restorations wherecomposite resins are bonded to the enamel using acid etch techniques. Total etch adhesion systems are still considered as the gold standard among bonding systems. However, clinicians have a tendency to use adhesive systems with simpler application procedures. The aim of the present stu...

Journal: :American journal of dentistry 2010
Ali I Abdalla

PURPOSE To evaluate the effect of water storage on the microtensile dentin bond strength of one total-etch and four self-etching adhesives to dentin. METHODS The adhesive materials were: one total-etch adhesive (Admira Bond) and four self-etch adhesives (Clearfil S tri Bond, Hybrid Bond, Futurabond NR, Adhe SE). Freshly extracted human third molar teeth were used. For each tooth, dentin was e...

2013
Zahra Jaberi-Ansari Maryam Mahdilou Maryam Ahmadyar Saeed Asgary

Background and aims. Bonding of composite resin filling materials to pulp protecting agents produces an adhesive joint which is important for the quality of filling as well as success of restoration. We aimed to assess the bond strength of composite resin to three pulp capping biomaterials: Pro Root mineral trioxide aggregate (PMTA), Root MTA (RMTA) and calcium enriched mixture (CEM) cement, us...

2005
Junghoon Yeom Yan Wu John C. Selby Mark A. Shannon

When etching high-aspect-ratio silicon features using deep reactive ion etching DRIE , researchers find that there is a maximum achievable aspect ratio, which we define as the critical aspect ratio, of an etched silicon trench using a DRIE process. At this critical aspect ratio, the apparent etch rate defined as the total depth etched divided by the total elapsed time no longer monotonically de...

1998
Patrick B. Chu Richard Yeh Gisela Lin Je C. P. Huang Brett A. Warneke Kristofer S. J. Pister

A gas-phase, room-temperature, plasmaless isotropic etching system has been used for bulk and thin lm silicon etching. A computer controlled multi-chambered etcher is used to provide precisely metered pulses of xenon di uoride (XeF2) gas to the etch chamber. Etch rates as high as 15 microns per minute have been observed. The etch appears to have in nite selectivity to many common thin lms, incl...

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