نتایج جستجو برای: thermal chemical vapor deposition

تعداد نتایج: 673952  

Journal: :Optics letters 1997
E M Dianov V M Mashinsky V B Neustruev O D Sazhin V V Brazhkin V A Sidorov

Spectroscopic properties of germanium oxygen-deficient centers were studied in vapor axial deposition and modified chemical-vapor deposition germanosilicate glass after hydrostatic densification by as much as 19%. Gaussian decomposition showed a broadening and a significant shift of the initial absorption bands at 5.11 and 5.42 eV. A threefold decrease of the 3.15-eV luminescence band was revea...

Journal: :Journal of nanoscience and nanotechnology 2009
Jun Wu Yanfeng Ma Daiming Tang Chang Liu Qinwen Huang Yi Huang Huiming Cheng Dapeng Chen Yongsheng Chen

We present a new process to get in-situ-growth carbon nanotubes (CNTs) array device with good FE properties by CO2-assisted thermal chemical vapor deposition (CVD). Field Emission measurement shows that introducing CO2 into CNTs growth system leads to a significant enhancement in the emission properties, both the turn-on field and threshold field decrease. Raman, SEM and TEM investigation resul...

1992
D. T. Gillespie

It is widely believed that the chemical master equation has no rigorous microphysical basis, and hence no a priori claim to validity. This view is challenged here through arguments purporting to show that the chemical master equation is exact for any gas-phase chemical system that is kept well stirred and thermally equilibrated.

1999
E. Jurdik H. van Kempen

We present calculations of surface growth in laser-focused nanostructure fabrication. We show that theoretical predictions of the structure pro le's shape depend sensitively on the model used to describe the growth, and also on the parameters chosen within the model. This sensitivity illustrates that growth e ects can play a major role in laser-focused atomic deposition, and also suggests that ...

1996
I. A. Shareef G. W. Rubloff W. N. Gill

Deposition rates, wet etch rates, and thickness uniformity experiments were performed using O3/TEOS thermal chemical-vapor deposition. Our results for oxide deposition show optimum process window around 200 Torr for producing films of good quality ~uniformity and material properties!. This is in excellent agreement with the modeling predictions over a broad range of pressure ~100–600 Torr! and ...

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