Exploring the resolution limit of electron-beam lithography is of great interest both scientifically and technologically. However, when electron-beam lithography approaches its resolution limit, imaging and metrology of the fabricated structures by using standard scanning electron microscopy become difficult. In this work, the authors adopted transmission-electron and atomic-force microscopies ...

Nanoimprint lithography (NIL) is a compelling technique for low cost nanoscale device fabrication. The precise and repeatable replication of nanoscale patterns from a single high resolution patterning step makes the NIL technique much more versatile than other expensive techniques such as e-beam or even helium ion beam lithography. Furthermore, the use of mechanical deformation during the NIL p...

In this paper a review of the authors results on mathematical modeling of the processes at electron or ion beam lithography of nanostructures is presented. Our Monte Carlo simulation tools for electron and ion exposures are successfully applied for the energy deposition calculation at electron or ion lithography of resist layers. At ion lithography electronic energy losses of penetrating electr...

The performance of depth reconstruction in binocular stereo relies on how adequate the predefined baseline for a target scene is. Wide-baseline stereo is capable of discriminating depth better than the narrow-baseline stereo, but it often suffers from spatial artifacts. Narrow-baseline stereo can provide a more elaborate depth map with fewer artifacts, while its depth resolution tends to be bia...

The ability to fabricate structures from the microto the nanoscale with high precision in a wide variety of materials is of crucial importance to the advancement of microand nanotechnology and the nanosciences. The semiconductor industry has been pushing high-precision nanoscale lithography to manufacture ever-smaller transistors and higher-density integrated circuits (ICs). Critical issues, su...