The emission characteristics of several Cu lines emitted from a Ne-Ar mixed gas glow discharge plasma were investigated. The addition of small amounts of Ar to a Ne plasma increases the sputtering rate of a Cu sample because Ar ions, which work as the impinging ions for cathode sputtering, are predominantly produced through Penning ionization collisions between Ne metastables and Ar atoms. Ar a...

copper thin films with nano-scale structure have numerous applications in modern technology.  in this work, cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by dc magnetron sputtering technique at room temperature in pure ar gas. the sputtering time was considered in 4, 8, 12 and 16 min, respectively. the thickness effect on the structural, morpholo...

Porous materials are ubiquitous in the universe and weathering of porous surfaces plays an important role in the evolution of planetary and interstellar materials. Sputtering of porous solids in particular can influence atmosphere formation, surface reflectivity and the production of the ambient gas around materials in space. Several previous studies and models have shown a large reduction in t...

We study crystalline surface evolution in extreme environments, where high-energy atoms impinge on a to cause sputtering, growth and roughening. For our model system, we the of Ni(111) under Ni atom bombardment, using Molecular Dynamics (MD) simulation Sutton-Chen force field, uppermost layers are free move, supported by thermostatically controlled above rigid template. The MD statistics sputte...

Amorphous fluorinated carbon (a-CF(x)) films have a variety of potential technological applications. In most such applications these films are exposed to air and undergo partial surface oxidation. X-ray photoemission spectroscopy has been used to study the oxidation of fresh a-CF(x) films deposited by magnetron sputtering. The oxygen sticking coefficient measured by exposure to low pressures (<...

We describe the setup, characteristics, and application of an in vacuo ion-sputtering and electron-beam annealing device for the postpreparation of scanning probes (e.g., scanning tunneling microscopy (STM) tips) under ultrahigh vacuum (UHV) conditions. The proposed device facilitates the straightforward implementation of a common two-step cleaning procedure, where the first step consists of io...

Novel ultrathin TiO2–Cu nanoparticulate films sputtered by highly ionized pulsed plasma magnetron sputtering (HIPIMS) lead to faster bacterial inactivation compared to more traditional sputtering approaches with an appreciable metal saving. HIPIMS sputtering induces a strong interaction of the TiO2–Cu-ions (M ) with the polyester surface due to the high fraction and density of M-ions interactin...

Mechanical properties of soft magnetostrictive FeCo-based thin films is one the critical along with their magnetic properties. To fully exploit potential in magnetic-microelectromechanical (MagMEMs) application, elastic and inelastic as well strength need to be considered. This paper presents mechanical FeCoCr at varied Cr concentrations from 2.6 9.6 at% fabricated by RF Sputtering. Nanoindenta...

Amorphous carbon (a-C) films, having low secondary electron yield (SEY), are used at CERN to suppress multipacting in the beam pipes of particle accelerators. It was already demonstrated that hydrogen impurities increase SEY a-C films. In this work, a systematic characterization set coatings, deliberately contaminated by deuterium during magnetron sputtering deposition, scanning microscopy, ion...