Promising wavelengths for next-generation lithography with a wavelength shorter than 13.5 nm based on synchrotron X-ray source are discussed. Theoretical and experimental values of the reflection coefficients multilayer mirrors providing maximum reflectivity in range 11.4-3.1 presented. The theoretical efficiency optics is compared different wavelengths. Keywords: lithography, optics, mirrors.

Uniaxial optical anisotropy in the geometrical-optics approach is a classical problem and most of the theory is known for at least fifty years. Although the subject appears frequently in the literature, it is nearly silent about wave propagation through inhomogeneous anisotropic media. At the same time, the rapid advances in liquid-crystal lenses call for a good overview of the theory on wave p...