نتایج جستجو برای: plasma chemistry
تعداد نتایج: 459832 فیلتر نتایج به سال:
Plasma atomic layer etching is a dry process using dose step to modify material’s surface chemistry and an etch remove the modified layer. This method of has certain advantages over reactive ion due its self-limiting for highly controllable depth reduced roughness. In this paper, we expand upon anisotropic, plasma recipe used thin films silicon nitride, which uses H2 material SF6 surface. Sever...
1 Future Industries Institute, University of South Australia, Adelaide, SA, Australia, 2 Space Plasma, Power and Propulsion Laboratory, Research School of Physics and Engineering, The Australian National University, Canberra, ACT, Australia, 3 York Plasma Institute, Department of Physics, University of York, York, UK, 4 Department of Electrical and Electronic Engineering, Meijo University, Nago...
In this work, we optimize a CH3F/O2/He/SiCl4 chemistry to etch silicon nitride gate spacers for 3D CMOS devices in 300 mm inductively coupled plasma reactor. The has high directivity and selectivity Si SiO2. A cyclic approach, which alternates with CH2F2/O2/CH4/He plasma, is investigated. Using quasi situ x-ray photoelectron spectroscopy ellipsometry measurements, etching mechanisms are propose...
Orange juice is one of the most popular juices sold in world. Although very popular, orange market pasteurized, presenting off-flavor compounds and aromas different from freshly squeezed juice. This study investigated how green chemistry, through application glow discharge plasma, can help improve aroma mitigate off-flavors pasteurized was processed at plasma flow rates (10 to 30 mL/min) for 10...
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