Glass micromachining is a basic technology to achieve microfluidic networks for lab-on-a-chip applications. Among several methods to microstructure glass, the simplest and most widely applied is wet chemical etching (WE). However, accurate control of the reaction conditions to perform reproducible, fast and safe glass etching is not straightforward. Herein, microwave-assisted WE is demonstrated...

Nanoimprinting technology was first developed in 1995 and is now recognized as one of the most promising approaches for large-area and low-cost fabrication of nanostructures. In this presentation, three types of roller-based nanoimprinting and contact-printing methods developed in NCKU in recent years will be addressed. First of all, a Laser-Assisted Roller Imprinting (LARI) method which can di...

The effect of the oxidizer present in etching solution on surface morphology and microstructure obtained after porosifying a p-type silicon wafer using metal-assisted chemical was studied. morphologies Si wafers porosified two different solutions, HF/H 2 O HF/KMnO 4 , were compared to establish how either oxidizers (H or KMnO ) should be chosen depending desired application. A comparative study...

The cutting of single-walled carbon nanotubes by an 80 keV electron beam catalyzed by nickel clusters is imaged in situ using aberration-corrected high-resolution transmission electron microscopy. Extensive molecular dynamics simulations within the CompuTEM approach provide insight into the mechanism of this process and demonstrate that the combination of irradiation and nickel catalyst is cruc...

Nanoporous silicon (NPSi) has received significant attention for its potential to contribute to a large number of applications, but has not yet been extensively implemented because of the inability of current state-of-the-art nanofabrication techniques to achieve sufficiently small pore size, high aspect ratio, and process scalability. In this work we describe the fabrication of NPSi via a modi...