نتایج جستجو برای: magnetron
تعداد نتایج: 4577 فیلتر نتایج به سال:
We report measurements of millimeter wave emission from a rippled-field magnetron (crossed-field FEL). This is a novel source of coherent radiation in which electrons move in quasi-circular orbits under the combined action of a radial electric field, a uniform axial magnetic field and an azimuthally periodic wiggler magnetic field. We observe %300kW of RF power in a spectral line whose frequenc...
We report the growth of high-quality AlN films on graphene. The graphene films were synthesized by CVD and then transferred onto silicon substrates. Epitaxial aluminum nitride films were deposited by DC magnetron sputtering on both graphene as an intermediate layer and silicon as a substrate. The structural characteristics of the AlN films and graphene were investigated. Highly c-axis-oriented ...
Characterization and Performance of LiFePO4 Thin-Film Cathodes Prepared with Radio-Frequency Magnetron-Sputter Deposition Jian Hong,* Chunsheng Wang,** Nancy J. Dudney,** and Michael J. Lance Department of Chemical Engineering, Tennessee Technological University, Cookeville, Tennessee 38505, USA Department of Chemical and Biochemical Engineering, University of Maryland, College Park, Maryland 2...
Junaid Muhammad, Daniel Lundin, Justinas Palisaitis, Ching-Lien Hsiao, Vanya Darakchieva, Jens Jensen, Per Persson, Per Sandström, W-J Lai, L-C Chen, K-H Chen, Ulf Helmersson, Lars Hultman and Jens Birch, Two-domain formation during the epitaxial growth of GaN (0001) on c-planeAl2O3 (0001) by high power impulse magnetron sputtering, 2011, Journal of Applied Physics, (110), 123519. http://dx.doi...
Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by ...
Abstract Ion-induced secondary electron emission of surfaces occurs in all gas discharges which have contact to such as electrodes or chamber walls. These electrons (SEs) play an important role, for instance, the performance DC discharges, RF and magnetron sputtering discharges. SE generation can be separated into potential (PEE) due neutralization incident ion upon impact kinetic (KEE) electro...
We report the discovery of a face-centered cubic (Al1-xCrx)2O3 solid solution [0.60 preferred orientation and exhi...
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