We have developed an advanced process for blaze angle reduction of x-ray gratings the soft, tender, and EUV spectral ranges. The is based on planarization anisotropically etched Si blazed grating followed by a chemically selective plasma etch. This provides way to adjust any lower value with high accuracy. Here we demonstrate extremely low 0.04°±0.004°. For 100 lines/mm Mo/Si multilayer coating...
