Some conventional machining methods have been developed to machine microelectrodes. However, these methods still require too much time and too many resources. This paper uses electrochemical etching as an alternative method for the simple and cheap fabrication of microelectrodes. Electrochemical etching is usually considered an appropriate method of producing sharp probes. However, it is possib...

This study evaluated the one-year clinical performance of a one-step, self-etch adhesive (Optibond All-in-One, Kerr, CA, USA) combined with a composite (Herculite XRV Ultra, Kerr Hawe, CA, USA) to restore NCCLs with or without prior acid etching. Restorations performed by the same practitioner were evaluated at baseline and after 3, 6, and 12 months using modified USPHS criteria. At 6 months, t...

The current laboratory study is evaluating the effect of hydrofluoric acid etching duration on the surface characteristics of five silica-based glass ceramics. Changes in the pore pattern, crystal structure, roughness, and wettability were compared and evaluated. Seventy-five rectangularly shaped specimens were cut from each material (IPS e-max™, Dentsply Celtra™, Vita Suprinity™, Vita mark II™...

We present growth studies on gallium nitride (GaN) stripes with {101̄1} side facets grown on c-oriented GaN templates on sapphire. Via plasma enhanced chemical vapor deposition (PECVD), a 20 nm thick SiO2 mask is deposited on top of the templates. Afterwards, a polymethylmethacrylate (PMMA) based resist is patterned with stripes oriented along the GaN a-direction by electron beam (e-beam) lithog...

microfabrication applications, it is widely used to transfer the designed patterns from an etching mask to the substrate. When the sample is immersed into the etching bath, the etchant only contacts and reacts with the substrate surfaces where are uncovered by the etching mask. The suitable materials for the mask can be polymers or other materials such as photoresist, SU-8,SiO2 andSi3N4, which ...

PURPOSE The aim of this study was to evaluate the effects of additional acid etching and curing mechanism (light-curing or self-curing) of a composite resin on the dentin bond strength and compatibility of one-step self-etching adhesives. MATERIALS AND METHODS Sixteen human permanent molars were randomly divided into eight groups according to the adhesives used (All-Bond Universal: ABU, Clear...

Chlorine in a nitrogen ambient is used to clean silicon surfaces of impurities by etching a thin layer from the surface prior to silicon epitaxial growth. Silicon etch rates of 1-10 nm/min could be achieved for temperatures from 525C to 575C. The etching of a thin layer of silicon from the surface is also capable of removing phosphorus from the surface, which conventionally is difficult to remo...

Grass’ formation is the very common defects for via etch process when using a BCl3/Cl2 as basic gases in an inductively coupled plasma (ICP) system. Presence of grass can potentially degrade device performance due to poor metallization coverage. In this study we found that grass formation strongly depends on GaAs surface condition prior to etch. Any surface contaminants, such as photo resist re...

We describe a fabrication technique for double-paddle oscillators based solely on wet etching, resulting in quality factors up to 8 ·105 at room temperature and in vacuum. The quality factor achieved is the highest demonstrated so far at room temperature. The fabrication procedure, not involving any dry etching step, represents a valid and low cost alternative to the other techniques previously...