This paper describes the Q enhancement of inductor or resonance circuit based on the controlled CMOS transonductance, which is applicable to either on-chip inductor or off-chip inductor. The proposed circuit configuration of high Q enhancement is evaluated for the RF transmit filter of a LTE mobile comm’s micro base station, with the Q factor of over 3000 and the capacity of 10W. A tunable filt...

Abstract— This paper develops a method of modelling and designing air-gapped ferrite inductor as filter for large current application of grid-tied inverter. The design method incorporates magnetization curve of the ferrite materials while the modelling of the inductor is based on inverse JilesAtherton model. The dynamic performance of the designed ferrite inductor in the DC-AC inverter circuit ...

The structure of the miniature three–dimensional (3-D) inductor is presented in this paper. The proposed miniature 3-D inductors have been fabricated in a standard digital 0.35m one-poly-four-metal (1P4M) CMOS process. According to the measurement results, the self-resonance frequency SR of the proposed miniature 3-D inductor is 34% higher than the conventional stacked inductor. Moreover, the p...

In this study, the authors propose a non-isolated high step-up interleaved DC/DC converter that can be applied to sustainable energy system. The proposed achieves voltage gain by applying coupled inductor and switched capacitor method based on an boost converter. two inductors connected in parallel with input side have distinct structure. Specifically, single has primary secondary series output...

This paper presents an interleaved boost converter with coupled inductors for photovoltaic (PV) energy conversion. The proposed soft-switching boost converter uses an interleaved method to increase its power density and coupled-inductor technology to extend its step-up voltage ratio. To reduce switching losses of active switches, the proposed interleaved boost converter incorporates a synchrono...

A high Q-factor (quality-factor) spiral inductor fabricated by the CMOS (complementary metal oxide semiconductor) process and a post-process was investigated. The spiral inductor is manufactured on a silicon substrate. A post-process is used to remove the underlying silicon substrate in order to reduce the substrate loss and to enhance the Q-factor of the inductor. The post-process adopts RIE (...