Chemical–mechanical polishing (CMP) is a process that planarizes semiconductor surfaces and essential for the manufacture of highly integrated devices. In CMP, pad conditioning using disk with diamond grit adopted to maintain surface roughness remove debris. However, uneven wear by unavoidable in CMP. this study, we propose contact-area-changeable system utilize it conduct preliminary study imp...

A CHO mutant line, MAR-11, was isolated using a cytotoxic lectin, Maackia amurensis agglutinin (MAA). This mutant has decreased levels of cell surface sialic acid relative to both wild-type CHO-K1 and Lec2 mutant CHO cells. The CMP-sialic acid transporter (CMP-SAT) gene in the MAR-11 mutant cell has a C-T mutation that results in a premature stop codon. As a result, MAR-11 cells express a trunc...

BACKGROUND This study investigated the validity of self-reported concentration and memory problems (CMP) in residents environmentally exposed to manganese (Mn). METHOD Self-report of CMP from a health questionnaire (HQ) and the Symptom Checklist-90-Revised (SCL-90-R) was compared to neuropsychological assessment (Trails A&B; Digit Span; Digit Symbol; Similarities; Auditory Consonant Trigrams,...

Recent advances in semiconductor manufacturing and engineering technologies have led to the inclusion of more than one CPU core in a single physical processor package. This, popularly known as Chip Multi Processing (CMP), allows multiple instruction streams to execute at the same time. CMP is in addition to today’s Simultaneous Multi Threading (SMT) capabilities, like Intel R © Hyper-Threading ...

Our project starts from investigating if instruction-based sharing exists on commercial workloads such as Apache, Zeus, Jbb, and Oltp running on CMPs. We find that there is a large amount of instruction-based sharing on CMPs. Constructive interference at the instruction cache miss level also exists among different CMP cores. We further study if the implementation of a shared Markov table can he...

The research methods and the first results obtained in study of roughness single-crystal silicon (111) substrates processed at final stage by various are described: traditional polishing without use chemical-mechanical (CMP), with CMP CMP, but oxide cerium nanopowders. efficiency using CeO 2 nanopowders has been demonstrated. following effective values were obtained: - 3.56 nm, 0.54 0.93 nm. Ke...

The stereospecific intramolecular alkylation of a hydroperoxyacetal provides the basis for the first asymmetric synthesis of the dioxane propionate core of the peroxyplakorates. Chemoselective hydrometallation of an alkyne in the presence of a peroxide is used to introduce a synthon for the polyunsaturated side chains of the peroxyplakorates. The route suggests a general solution for the 1,2-di...

A spectrophotometric method of assay of mefenamic acid in tablets involving, dissolving the tablet powder in 1,4-dioxane and measuring the absorbance at 353.2 nm. The concentration of mefenamic acid is determined using the previously prepared calibration curve using standard solution of mefenamic acid in dioxane. The method was tested by assay of six different commercial tablets containing mefe...

A crystal-to-crystal transformation was observed from a green chain compound CuBr2(1,4-dioxane)2(H2O)2 (1) to a brown layered compound (CuBr2)3(1,4-dioxane)2 (2). The hydrogen bond connecting chains in were replaced by a μ-Br bridge in and the antiferromagnetic interaction between the metal atoms in became stronger than in 1.