The bulk etch rate for CR-39 in NaOH/ethanol was faster than those in aqueous solution of NaOH (NaOH/H2O). Furthermore, a layer of precipitate always accumulates on the surface of CR-39 detector during etching in NaOH/ethanol, which is absent during etching in NaOH/H2O. In the present work, mass spectrometry results have shown that the same etched products are present in the etchants of NaOH/H2...

A rational approach for creating branched ZnO/Si nanowire arrays with hierarchical structure was developed based on a combination of three simple and cost-effective synthesis pathways. The crucial procedure included growth of crystalline Si nanowire arrays as backbones by chemical etching of Si substrates, deposition of ZnO thin film as a seed layer by magnetron sputtering, and fabrication of Z...

Free of tool wear, residual stress, and surface damage, electrochemistry plays a significant role in precision machining. We report here semiconductor polishing technique based on electrochemically induced chemical etching, which the concentration distribution electrogenerated etchant between electrode workpiece can be precisely controlled by pulse frequency potential applied to electrode. A th...

In this study, a gallium nitride (GaN) template fabrication method for efficient chemical lift-off (CLO) is developed. CLO slower than other methods. An air tunnel structure formed using photoresist to reduce the process time and improve etchant penetration rate. Furthermore, an aluminum (AlN) sacrificial layer mounted on trapezoid-shaped patterned sapphire substrate. GaN epitaxial growth obser...