نتایج جستجو برای: plasma emission spectroscopy
تعداد نتایج: 679329 فیلتر نتایج به سال:
The etching of GaN was investigated in an Ar/Cl2 inductively coupled plasma. Optical emission spectroscopy and an ion flux probe were used to obtain insight into the etch mechanisms during processing. Langmuir probe measurements were also used to determine the basic Ar/Cl2 plasma characteristics. Etch rates of 500 nm/min were obtained at relatively low Cl2 fractions of 50%. The dominant emissio...
In this study, a TiO2-CNT-Ag ternary composite film was successfully synthesized using the plasma-enhanced chemical vapor deposition method by simultaneously feeding carbon nanotube (CNT)/Ag suspension and titanium tetraisopropoxide gas. The prepared characterized scanning electron microscopy, transmission energy-dispersive X-ray spectroscopy, photoelectron diffraction, ultraviolet-visible spec...
tm3+, yb3+ and tm3+/yb3+ doped lavo4 nanostructures were synthe-sized for the first time by using the hydrothermal method with the aid of la(ch3co2)3 as lanthanum source in presence of oleic acid as surfactant. the products were characterized by x-ray diffraction (xrd), scanning electron microscopy (sem), transmission electron microscopy (tem), photoluminescence (pl) spectroscopy and uv–vis di...
Welding diagnostics by means of line-to-continuum method and SFFS spectral band selection [7503-166]
Plasma optical spectroscopy is a technique widely used for on-line welding diagnostics, given the rich information to be found within the plasma spectra generated during the process. One of the key factors in this regard is the computational performance of the whole monitoring system, as it determines the resulting spatial resolution. The electronic temperature of the welding plasma is typicall...
Laser-Induced Breakdown Spectroscopy (LIBS) was applied to the analysis of bioceramic samples. The relationship between sample hardness and LIBS plasma properties was investigated, with comparison to conventional Vickers hardness measurements. The plasma excitation temperature Te was determined using the lineto-continuum ratio for the Si (I) 288.16 nm emission line; we have demonstrated a linea...
In this article we review the prospects of laser wakefield accelerators as next generation light sources for applications. This work arose as a result of discussions held at the 2013 Laser Plasma Accelerators Workshop. X-ray phase contrast imaging, x-ray absorption spectroscopy, and nuclear resonance fluorescence are highlighted as potential applications for laser–plasma based light sources. We...
Measurements of the densities of the molecular and atomic ions (nH, nH2, nH3) were carried out in hydrogen recombination plasma in the linear divertor plasma simulator, TPD-SheetIV. The molecular and atomic ion currents were detected using an omegatron mass analyzer. The ground-state vibrational temperature of hydrogen molecules Tvib is obtained by measurement with VUV emission spectroscopy. Ta...
شکل و اندازه ذرات در این نانوکامپوزیت جدید توسط میکروسکوپ الکترونی روبشی انتشار زمینه (field emission scanning eectron microscopy)، دستگاه پراش سنج پرتو ایکس (x-ray diffraction)، و طیف سنجی تبدیل فوریه مادون قرمز (fourier transform infrared spectroscopy) مورد مطالعه قرار گرفت. بر اساس تجزیه وتحلیل پراش پرتو ایکس، میانگین اندازه ذرات در محدوده nm 42-32 بدست آمد. تصاویر میکروسکوپ الکترونی روبشی ا...
This paper introduces recent optical measurements of radicals in atmospheric pressure non-thermal plasma. Laser-induced fluorescence (LIF), laser absorption, and optical emission spectroscopy (OES) techniques have been applied for density and temperature measurements of OH radicals, NO molecules, ozone, atomic oxygen, atomic nitrogen, and N2( A3Σ u ) metastables in pulsed corona and pulsed diel...
This project is focused on understanding the optoelectronic properties of silicon nanoparticles produced by nonthermal silane plasmas. In situ FTIRis capable of distinguishing surface hydride coverage of silicon nanoparticles and is a prominent technique used to study the surface chemistry of nanoparticles during exposure to plasma environments. Ex situ photoluminescence,UV-vis, SEM, RBS, XRD, ...
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