We demonstrate plasmonic lithography with an optical contact probe to achieve high speed patterning without external gap distance control between the probe and the photoresist. The bottom surface of the probe is covered with a 10 nm thickness silica glass film for the gap distance control and coated with self-assembled monolayer (SAM) to reduce friction between the probe and the photoresist. We...

Micro and nano-scale hydrogel lines can be fabricated on substrates by top-down approaches such as lithography and micro/nano-imprint. When in contact with a solvent, the hydrogel lines swell under the constraint of the substrate, often resulting in distorted shapes or instability patterns. In this paper, using a nonlinear finite element method, the effects of material and geometry on swell ind...

In this paper, we report direct patterning of metal nanostructures using an embossed solid electrochemical stamp. Microforming of solid superionic stamps using Si templates--analogous to polymer patterning in nano-imprint lithography--is explored. Silver sulfide (Ag₂S)--a superionic conductor with excellent microforming properties--is investigated as a candidate material. Important parameters o...

This paper introduces a new methodology for the fabrication of strain-sensor elements for MEMS and NEMS applications based on the tunneling effect in nano-granular metals. The strain-sensor elements are prepared by the maskless lithography technique of focused electron-beam-induced deposition (FEBID) employing the precursor trimethylmethylcyclopentadienyl platinum [MeCpPt(Me)(3)]. We use a cant...

Nanoscale patterning of fullerene materials with peculiar intrinsic electronic and optical properties is crucial importance for their widespread applications. However, it remains a daunting challenge current methods that suffer from both complicated lithography procedures additives photopolymers or photochemicals detrimental to the pristine fullerene. Here, we developed contamination-free laser...

In recent days, the micro/nano machining becomes an important process to fabricate micro/nano scale dimensional patterns or devices for many applications, especially in electrical and electronic devices. There are two kinds micro-machining in use. i) bulk micromachining, ii) surface micro-maching. In the case of bulk micromaching, the structures can be made by etching inside a substrate selecti...