Nanometer-scale patterning of surfaces is a highly relevant and interesting topic of research today, owing to its potential contributions to device miniaturization and creation of novel functional interfaces with applications ranging from electronics to biomedicine. Several methods of nanopatterning are known, for example, nanoimprint lithography, laser interferometry, extreme ultraviolet inter...

An organic semiconductor laser, simply fabricated by UV-nanoimprint lithography (UV-NIL), that is pumped with a pulsed InGaN LED is demonstrated. Molecular weight optimization of the polymer gain medium on a nanoimprinted polymer distributed feedback resonator enables the lowest reported UV-NIL laser threshold density of 770 W cm(-2) , establishing the potential for scalable organic laser fabri...

We report a dramatic improvement of the spatial coherence and beam divergence (0.66 mrad) of a 13.2 nm wavelength Ni-like Cd tabletop laser by injection seeding the soft x-ray laser amplifier with high-harmonics pulses generated in a Ne gas jet. This phase coherent laser is an attractive light source for at-wavelength interferometry of extreme ultraviolet lithography optics and other applications.

Article history: Received 29 March 2016 Received in revised form 7 June 2016 Accepted 20 June 2016 Available online 21 June 2016 In this work we demonstrate a fabrication process for three-dimensional (3D) container, which is composed of inverted pyramidal pit (IPP) and a capwith nanosized opening fabricated by combining laser interference lithography and anisotropic wet etching processes. The ...

A new heterodyne nano-displacement with error reduction is presented. The main errors affecting the displacement accuracy of the nano-displacement measurement system including intermodulation distortion error, cross-talk error, cross-polarization error and phase detection error are calculated. In the designed system, a He-Ne laser having three-longitudinal-mode is considered as the stabiliz...

By interfering two small diameter Gaussian laser beams, scanning beam interference lithography ~SBIL! is capable of patterning linear gratings and grids in resist while controlling their spatial phase distortions to the nanometer level. Our tool has a patterning area that is up to 300 mm in diameter. The motive for developing SBIL is to provide the semiconductor industry with a set of absolute ...