نتایج جستجو برای: inp materials

تعداد نتایج: 439988  

2008
William Snodgrass Milton Feng

We demonstrate vertically and laterally scaled GaAsSb/InP type-II DHBTs with fT = 670 GHz at 10.3 mA/μm emitter current density and off-state collector-emitter breakdown voltage BVCEO = 3.2 V. Small-signal modeling is used to extract delay terms and to identify material design and device fabrication requirements for next-generation devices with > 1 THz cutoff frequencies. INTRODUCTION InP based...

2010
Shanna Marie Crankshaw Constance J. Chang-Hasnain Peidong Yang Steven Leone Shanna Crankshaw Connie J. Chang-Hasnain

III-V semiconductor materials form a broad basis for optoelectronic applications, including the broad basis of the telecom industry as well as smaller markets for high-mobility transistors. In a somewhat analogous manner as the traditional silicon logic industry has so heavily depended upon process manufacturing development, optoelectronics often relies instead on materials innovations. This th...

2013
J. P. Marden

W42 Effect of a live-yeast-based product on colostrum quality and milk yield in first month of lactation on a private dairy farm. C. Julien*1,2, A. Fernandez3, and J. P. Marden3, 1INRA, UMR1289 TANDEM, Tissus Animaux Nutrition Digestion Ecosystème et Métabolisme, Castanet-Tolosan, France, 2Université de Toulouse, INPT ENSAT, INP-ENVT, UMR1289 TANDEM, Castanet-Tolosan, France, 3Lesaffre Feed Add...

2004
C. H. Fields M. Sokolich D. Chow R. Rajavel M. Chen D. Hitko Y. Royter Thomas

We present the results of an InP HBT device development process. We have developed a new HBT device fabrication approach that represents a major departure from traditional compound semiconductor manufacturing techniques. The new generation of deep submicron InP-based HBTs presented here uses an ion implanted subcollector and offers significantly improved performance, integration, and device rel...

1999
D. K. Sengupta S. D. Gunapala S. V. Bandara

InP based ultra-thin quan[um well is changed from a square well, with quantum well infrared photodetector via rapid sharp interfaces, to an error-function shaped well, thermal annealing with a corresponding change in the confined energy 1cvcIs[3,4]. This tunability is of interest to IR QWIPS such as the detector photoresponse and absolute rcsponsivity. by gas source molecular beam epitaxy (GSMB...

2017
Jan Dobrowolski John Goodrick

We prove that any left-ordered inp-minimal group is abelian and we provide an example of a non-abelian left-ordered group of dp-rank 2. Furthermore, we establish a necessary condition for group to have finite burden involving normalizers of definable sets, reminiscent of other chain conditions for stable groups. 0 Introduction and preliminaries One of the model-theoretic properties that gained ...

In this paper, a thin-film InP-based solar cell designed and simulated. The proposed InP solar cell has a periodic array of plasmonic back-reflector, which consists of a silver layer and two silver nanowires. The indium tin oxide (ITO) layer also utilized as an anti-reflection coating (ARC) layer on top. The design creates a light-trapping structure by using a plasmonic back-reflector and an an...

2012
Alexander Buck

and Introduction: There are currently no electrically-pumped semiconductor lasers that can operate in the 1-5 terahertz (THz) spectral range at room temperature. An alternative method of producing room temperature THz light is based on intra-cavity difference frequency generation (DFG) in dual wavelength mid-infrared quantum cascade lasers. Our THz DFG sources can provide tunable output of over...

2012
JOEL SCHLEEH

iii List of appended papers v

2018
Ludovico Megalini Simone Tommaso Šuran Brunelli William O Charles Aidan Taylor Brandon Isaac John E Bowers Jonathan Klamkin

We report on the use of InGaAsP strain-compensated superlattices (SC-SLs) as a technique to reduce the defect density of Indium Phosphide (InP) grown on silicon (InP-on-Si) by Metal Organic Chemical Vapor Deposition (MOCVD). Initially, a 2 μm thick gallium arsenide (GaAs) layer was grown with very high uniformity on exact oriented (001) 300 mm Si wafers; which had been patterned in 90 nm V-groo...

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