We have prepared Ni-V(2)O(5).nH(2)O core-shell nanocable arrays for Li(+) intercalation applications. Ni-V(2)O(5).nH(2)O nanocables were prepared via formation of Ni nanorod arrays through the template based electrochemical deposition, followed by coating of V(2)O(5).nH(2)O on Ni nanorods through electrophoretic deposition. Transmission electron microscopy (TEM) micrograph clearly shows the Ni ...

Electrochromic switching devices have elicited considerable attention because these thin films are among the most promising materials for energy-saving applications. The vanadium oxide system is simple and inexpensive because only a single-layer film of this material is sufficient for coloration. Vanadium dioxide thin films are fabricated by electrochemical deposition and cyclic voltammetry. Ch...

Molybdenum disulphide (MoS2) thin films have received increasing interest as device-active layers in low-dimensional electronics and also as novel catalysts in electrochemical processes such as the hydrogen evolution reaction (HER) in electrochemical water splitting. For both types of applications, industrially scalable fabrication methods with good control over the MoS2 film properties are cru...

In this work, we present the electrochemical deposition of manganese dioxide (MnO₂) thin films on carbon-coated TiN/Si micro-pillars. The carbon buffer layer, grown by plasma enhanced chemical vapor deposition (PECVD), is used as a protective coating for the underlying TiN current collector from oxidation, during the film deposition, while improving the electrical conductivity of the stack. A c...

Rhenium Re –Me alloys where Me = Ni, Fe, or Co were deposited galvanostatically. The plating bath consisted of ammonium perrhenate, nickel or cobalt sulfamate, or iron sulfate, citric acid, and magnesium sulfamate. The effects of bath chemistry and deposition time on faradaic efficiency FE , Re content, and partial deposition currents were determined. Rhenium contents as high as 93 atom % or FE...

Vertically self-aligned ZnO nanorods and nanotubes are fabricated on Si substrates by atomic layer deposition with the assistance of anodic aluminum oxide at 250°C. These nanostructures are equal in height, isolated, and vertical to the Si substrate. With 550 deposition cycles, we can fabricate regular arrays of ZnO nanorods with an average diameter of 70 nm and with a height of 470 nm. In part...

We summarize two approaches to integrated multiscale process simulation (IMPS), particularly relevant to integrated circuit (IC) fabrication, in which models for equipment (m) and feature (lm) scales are solved simultaneously. The first approach uses regular grids, and is applied to low-pressure chemical vapor deposition (LPCVD) of silicon dioxide from tetraethoxysilane (TEOS). The second appro...

Thin films of tungsten nitride were deposited from Cl4(CH3CN!W~N Pr) by metallorganic chemical vapor deposition ~MOCVD! in the presence and absence of ammonia (NH3) coreactant. Films were analyzed by X-ray diffraction, Auger electron spectroscopy, and X-ray photoelectron spectroscopy ~XPS!. Films grown with NH3 had increased nitrogen levels and decreased carbon and oxygen levels relative to fil...

Ultrathin crystalline ZrO(2) nanofilms have been facilely deposited on LiMn(2)O(4) particles at 120 °C using atomic layer deposition. The ZrO(2) coating shows high crystallinity, conformality and homogeneity, which contribute to considerably improved electrochemical performance of LiMn(2)O(4) at elevated temperature in lithium-ion batteries.