Thin films Indium tin oxide (ITO) with various thicknesses, from 130-620nm, have been deposited on the thin glass substrates by RF sputtering using ITO ceramic (90% wt. In2O3 and 10% wt. SnO2) target, and subsequently annealed in vacuum at various temperatures. Electrical and optical characteristics of ITO samples, before and after annealing at different temperatures, were investigated by four ...