نتایج جستجو برای: cuf2 deposition
تعداد نتایج: 92659 فیلتر نتایج به سال:
Acid deposition has been recognized as a serious environmental problem in China. Most acid deposition studies have focused on sulfur deposition and the pH of precipitation. However, as high concentration of alkaline dust is an important feature of the atmosphere in large parts of China, base cation deposition must be taken into account when discussing possible effects on soils and vegetation fr...
In this study, the effect of deposition temperature TiN thin films deposited using thermal atomic layer (ALD) method was investigated. TiCl4 precursor and NH3 reactive gas were used, rate, resistivity change, surface morphology characteristics compared in range 400 °C–600 °C. While decreased to 177 µΩcm as increased 600 °C, an increase roughness (Rq) 0.69 nm a deterioration step coverage identi...
چکیده در این پروژه به ارئه یک روش فیزیکی برای ساخت نانو ذرات سیلیکان بر روی ویفر سیلیکان می پردازیم. این روش که روش glad نامیده می شود اولین بار در سال 1996 توسط یک گروه تحقیقاتی کانادایی در دانشگاه آلبرتا ارائه گردید. همچنین برای لایه نشانی دستگاه خود را در حالت گرمادهی به روش پرتو الکترونی آماده کردیم. لایه نشانی را در دو زاویه° 75و ° 85 انجام دادیم. منحنی افت زمانی در دو ولتاژ یک و دو ولت ...
Nanowire is a cylindrical nano-structure with nanometer dimensions. In this research, the studied nanowire was made from the magnetic triple Ni-Fe-Co alloy.
 We utilized ordered porous anodic aluminum oxide as a template for the nanowire deposition. The nanowire arrays were electrodeposited in the cylindrical pores of the oxide layer by AC potential in a simple sulfate bath. Then the relatio...
in the present study, electrophoretic deposition (EPD) was used to obtain dense and crack-free layers of Al2O3 on carbon substrate. Microstructural study of the obtained layers by scanning electron (SEM) and optical microscopy (OM) approved that crack-free layers can be obtained by EPD technique. According to obtained results, isopropanol is a suitable media to obtian compact layers which is at...
In this paper, we present and review recent developments in the high-density plasma chemical vapor deposition (HDP CVD) of silicon-based dielectric films, and of films of recent interest in the development of lower-dielectric-constant alternatives. Aspects relevant to the HDP CVD process and using the process to achieve interlevel insulation, gap filling, and planarization are discussed. Result...
An original dimensionless study of the pure evaporation and precipitation stages of a spray pyrolysis process has been performed. An estimation of he evaporation time is proposed and the influence of the main processing parameters has been investigated. For operating conditions corresponding o industrial requirements, the main limiting step of the evaporation stage is thermal transfer from the ...
Available online 23 January 2009
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