the aim of this research is preparation of sno2 nanowires by means of thermal chemical reaction vapor transport deposition (tcrvtd) method from sno powders. the morphology, chemical composition and microstructure properties of the nanowires are characterized using field emission scanning electron microscope (fe-sem), eds, and xrd. the xrd diffraction patterns reveal that the sno2 nanowires have...

Owing to their high intrinsic thermal conductivity, carbon nanotubes (CNTs) have previously been incorporated into a variety of thermal management applications to improve cooling performance. Implementation of controlled CNT growth techniques and functionalization methods are applied herein to enhance boiling heat transfer from the porous capillary wicking surfaces widely used in high heat flux...

Chemical vapor deposition (CVD) is one of the key technologies for the epitaxial crystal growth of semiconductors. In order to obtain high-performance devices, atomically controlled thin films are required. Layer by layer growth consists of various processes, i.e ., the thermal decomposition of precursors, the adsorption of growing species, their surface migration, two-dimensional nucleation, t...

Ozone/TEOS thermal chemical vapor deposition ~CVD! has been investigated for SiO2 deposition on Si, using a cold-wall research reactor equipped to determine the effects of precursor concentration, deposition temperature ~300–500 °C!, and pressure ~30–200 Torr! on deposition rates, etch rates, and step coverage in the regime of subatmospheric CVD ~SACVD!. Deposition rates first increase with sub...

Articles you may be interested in Fabrication and characterization of single carbon nanotube emitters as point electron sources Appl. Source brightness and useful beam current of carbon nanotubes and other very small emitters Carbon nanotubes synthesized by biased thermal chemical vapor deposition as an electron source in an x-ray tube Appl. On-chip vacuum microtriode using carbon nanotube fiel...

Phase change cooling schemes involving passive heat spreading devices, such as heat pipes and vapor chambers, are widely adopted for thermal management of high heat-flux technologies. In this study, carbon nanotubes (CNTs) are fabricated on a 200 lm thick sintered copper powder wick layer using microwave plasma enhanced chemical vapor deposition technique. A physical vapor deposition process is...

For wafer sizes in state-of-the-art semiconductor manufacturing ranging up to 300 mm, the uniformity of processes across the wafer becomes a very important issue. We present a fully three-dimensional model for the feature scale simulation of continuum transport and reaction determined high-pressure chemical vapor deposition processes suitable for the investigation of such nonuniformities. The n...

Two sets of hydrogenated microcrystalline silicon thin-film samples were prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique at different deposition conditions of excited power and pressure. The correlation between the crystalline volume fraction for the samples determined from Raman spectra and the excited power, pressure, absorption coefficient, refractive index and optica...

The simultaneous generation of dust during the deposition of semiconducting thin films by radio frequency plasma enhanced chemical vapor deposition has so far been regarded as a troublesome by-product. However, we present results from recent microstructural investigations of carbonaceous dust particles from a methane precursor that demonstrate that the technique may be suited to generating full...