Plasmonic lithography may become a mainstream nanofabrication technique in the future. Experimental results show that feature size with 22 nm resolution can be achieved by plasmonic lithography. In the experiment, a plasmonic lens (PL) is used to focus the laser energy with resolution much higher than the diffraction limit and features are created in the thermally sensitive phase-change materia...

Organic solid state lasers have attracted considerable attentions because they have the potential to be tunable, flexible, biocompatible, and easily integrated into plastic optoelectronics.[1–8] Optically pumped laser has been reported in a very broad range of conjugated polymers and oligomers. However, for the electrically pumped organic lasers, there still exist many challenging problems to b...

Near-field two-photon optical lithography is demonstrated by using ;120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produces lithographic features with ;70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale two-photon absorption and polymerization in a commercial photoresist, SU-8. ...

Near-field multiphoton optical lithography is demonstrated by using ~120 fs laser pulses at 790 nm in an apertureless near-field optical microscope, which produce the lithographic features with ~ 70 nm resolution. The technique takes advantage of the field enhancement at the extremity of a metallic probe to induce nanoscale multiphoton absorption and polymerization in a commercial photoresist, ...

In this article, we report a mask-less and cleanroom-independent technique to fabricate Polydimethylsiloxane (PDMS)-based multi-depth microfluidic devices using a polystyrene (PS) mold with laser-induced multi-height bump patterns for PDMS soft-lithography. This technique offers a rapid and low-cost alternative to conventional PDMS mold creation, which requires more complicated mask-based photo...

A compact, high-brightness and practically debris-free laser-plasma soft x-ray source for proximity x-ray lithography is described. The target of the source is small liquid fluorocarbon droplets injected into vacuum with a piezoelectrically vibrated nozzle. Emission from heliumand hydrogenlike fluorine in the 1.2–1.7 nm wavelength range was determined to ;2310 photons/~sr-pulse!, which correspo...

Laser lithography was applied for Computer Aided Design and Computer Aided Manufacturing (CAD/CAM) fabrication of dental prostheses made of composite resin. First, the conditions to obtain the optimum resolution for photo-curing were determined, and then a composite resin full crown was fabricated by laser lithography. Second, a functionally graded composite resin post and core which had gradie...

Laser shaping was introduced to maskless projection soft lithography by using digital micro-mirror device (DMD). The predesigned intensity pattern was imprinted onto the DMD and the input laser beam with a Gaussian or quasi-Gaussian distribution will carry the pattern on DMD to etch the resin. It provides a method of precise control of laser beam shapes and photon-induced curing behavior of res...