The processes of modifying the structural and optical properties FP9120 S1813 diazoquinone–novolac photoresist films on single-crystal silicon wafers beyond range ions by implantation light B+, P+ heavy Sb+ have been studied using techniques attenuated total reflection Fourier-transform IR spectroscopy, indentation, measurement spectra. It has shown that during B+ ions, involving photosensitive...
