Experimental studies of gas-phase nanoparticle coating by photoinduced chemical vapor deposition (photoCVD) have shown that silica coatings can be produced with controllable thicknesses on different nanoparticle cores for a variety of applications. This study presents a chemical reaction sequence for the photo-CVD process to describe the production of silica coatings from the decomposition of t...

In this work, chromium disilicide nanowires were synthesized by chemical vapor deposition (CVD) processes on Si (100) substrates with hydrous chromium chloride (CrCl3 · 6H2O) as precursors. Processing parameters, including the temperature of Si (100) substrates and precursors, the gas flow rate, the heating time, and the different flow gas of reactions were varied and studied; additionally, the...

Multi-walled carbon nanotubes (MWCNTs) were prepared via chemical vapor deposition (CVD) using a series of different catalysts, derived from FeCoNiAl, CoNiAl and FeNiAl layered double hydroxides (LDHs). Catalyst-active particles were obtained by calcination of LDHs at 800 °C for 5 h. Nitrogen and hexane were used as the carrier gas and carbon source respectively, for preparation of MWCNTs using...

Microstructures of yttria stabilized zirconia thin fi lms deposited by aerosol assisted chemical vapor deposition (AA-CVD) are correlated with the thermal decomposition behavior of the corresponding metal precursors, zirconium and yttrium 2,4-pentanedionate. Process conditions of AA-CVD are investigated with the aim of producing dense and compact YSZ thin fi lms for applications as gas-tight el...

Recent advances in two-dimensional (2D) transition metal dichalcogenides have demonstrated their potential application in chemical sensors. However, the chemical vapor deposition (CVD) grown molybdenum disulfide (MoS2) humidity sensors are still largely unexplored. In this work, MoS2 thin films were grown on 1 cm 2 sapphire substrates through sulfurization of e-beam deposited Mo layers. The MoS...

Yttria-stabilized zirconia (YSZ) has been used as a thermal/environmental barrier coating for gas turbine engine blades. Current methods of fabrication include air plasma spraying (APS) and electron-beam physical vapor deposition (EB-PVD). The APS technique results in a coating that loses effectiveness with thermal cycling. The EB-PVD technique deposits a columnar microstructure which accommoda...

Ozone/TEOS thermal chemical vapor deposition ~CVD! has been investigated for SiO2 deposition on Si, using a cold-wall research reactor equipped to determine the effects of precursor concentration, deposition temperature ~300–500 °C!, and pressure ~30–200 Torr! on deposition rates, etch rates, and step coverage in the regime of subatmospheric CVD ~SACVD!. Deposition rates first increase with sub...

1 ABSTRACT A Monte-Carlo programme has been developed to simulate thin film deposition in a square groove. It demonstrates that conformal coating requires (1) the mean free part to be greater than the feature size; (2) a low sticking coefficient for incoming reactant molecules. 2 INTRODUCTION The increasing use of anisotropic etching in the manufacture of integrated circuits is stimulating rese...

Abstract We developed a localized plasma-enhanced chemical vapor deposition (PE-CVD) technique to deposit silicon oxide with sub-micrometer width on substrate using an atmospheric pressure plasma jet (APPJ) irradiated from nanopipette nozzle. To realize fine material deposition, hexamethyldisiloxane (HMDSO) was blown into the helium APPJ aperture of nanpopipette length limited size nanopipette....

We found that the atomic-concentration-ratio of carbon to silicon (C/Si ratio) in carbide (SiC) films formed by thermal chemical vapor deposition (CVD) was much greater than 1 when source gas for CVD dimethylsilane (DMS). Thus, we tried change carbon-inclusion levels film injecting some ion beams into a depositing SiC during process with DMS. Three beams, i.e., Si+, SiCH5+, or C+ ions were inje...