Superhydrophobic and superhydrophilic properties of chemically-modified graphene have been achieved in larger-area vertically aligned few-layer graphene nanosheets (FLGs), prepared on Si (111) substrate by microwave plasma chemical vapor deposition (MPCVD). Furthermore, in order to enhance wettability, silicon wafers with microstructures were fabricated, on which graphene nanosheets were grown ...

Initiated chemical vapor deposition (iCVD) is a novel process capable of producing a range of polymeric and multifunctional nanocoatings. The process utilizes hot filaments to drive gas phase chemistry which enables the deposition of true linear polymers rather than the highly crosslinked organic networks often associated with plasma enhanced CVD. Importantly, the object to be coated remains at...

Since the introduction of electron beam (EB) physical vapour deposition (PVD) thermal barrier coatings (TBCs) and their application to moving components in the hot gas stream, erosion has become a prime concern. EB PVD TBCs, due to their unique columnar microstructure are far more strain tolerant than their plasma sprayed (PS) counter parts and can thus be used under more exacting operating con...

Last 2 to 3 decades application of PVD (physical vapour deposition) hard coatings exponentially grows. However, the use of hard, thin films in the field of machine elements is the exception rather than the rule. The main problem lies in the relatively high contact pressure and the very complex loading of machine components, which demand a hard resistance surface and a tough core. In seminar it ...

Highly granular YBaCuO films on SrTlO, substrates wlth T,,,-90K and J,>lO' A/cm2 were prepared by non-vacuum aerosol deposition. The optical response for these films was investigated on a 10 x 10 pm2 mlcrobrldge. Besides a bolometrlc response around the transition temperature, a sharp response peak was observed at low temperature and high bias current using a He-Ne laser (0.63pm wavelength) lll...

In this paper, we present and review recent developments in the high-density plasma chemical vapor deposition (HDP CVD) of silicon-based dielectric films, and of films of recent interest in the development of lower-dielectric-constant alternatives. Aspects relevant to the HDP CVD process and using the process to achieve interlevel insulation, gap filling, and planarization are discussed. Result...

An original dimensionless study of the pure evaporation and precipitation stages of a spray pyrolysis process has been performed. An estimation of he evaporation time is proposed and the influence of the main processing parameters has been investigated. For operating conditions corresponding o industrial requirements, the main limiting step of the evaporation stage is thermal transfer from the ...

Available online 23 January 2009