نتایج جستجو برای: chemical etching

تعداد نتایج: 386897  

معزی‌زاده, مریم, نوجه‌دهیان, هانیه, ولی‌زاده حقی, هاله,

Objective: Zirconium oxide has gained the spotlight during the recent years as a high strength ceramic material. However, despite its mechanical superiorities, it forms a weak bond with different synthetic substrates and tissues due to its neutral nature and resistance against chemical agents. Therefore, it is important to improve the bonding technique in order to prevent microleakage and incre...

2009
V. N. Vasilets V. I. Sevastianov

The various plasma-chemical techniques are used for the surface functionalization and regulation of the biological characteristics of fluorocarbon polymers to enhance their blood compatibility. Modifications of the surface morphology and chemical structure to improve thromboresistive properties of polymers by plasma etching and deposition of biocompatible materials are demonstrated and discussed.

2004
Mohd Hairul Faizal Ahmad Sahbudin Shaari

Introduction Photodiode play important roles in optical communication systems nowadays. In this field, fiber optic cable is used as an information signal transmission medium between the light sources, sensors and photodiode. Many materials can provided to make the photodiode substrate in order to produce the detector to be used in application that require higher bandwidth and long distance tran...

Journal: :Dental Materials 2021

Recommendations to obtain the best bonding silica-based ceramics are prepare its surface by hydrofluoric-acid HF etching and regular application of a silane. This study investigated how HF-etching following ultrasonic water bath cleaning (recommended protocol improve with composite resin), modifies chemistry lithium disilicate glass-ceramic impacts chemical Lithium discs (IPS Emax Press, Ivocla...

2002
G. A. Keeler N. C. Helman P. Atanackovic D. A. B. Miller Edward L. Ginzton

We present a post-integration cavity resonance tuning technique for asymmetric Fabry-Perot MQW modulators flip-chip bonded to silicon CMOS. The process relies on highly selective chemical etching and GaAs surface oxidation. High-quality devices are successfully integrated.

B. Natarajan N. Jeyakumaran S. Ramamurthy V. Vasu

Porous silicon layers have been prepared from n-type silicon wafers of (100) orientation. SEM, FTIR and PL have been used to characterize the morphological and optical properties of porous silicon. The influence of varying etching time in the anodizing solution, on structural and optical properties of porous silicon has been investigated. It is observed that pore size increases with etching tim...

H Nasiri Vatan M.R Mohammadshafiee

To find a suitable treatment in the preparation of Nb surface for platinum electrodeposition, different methods such as thermal oxidation, anodic oxidation, mechanical roughening, and mechanical roughening with subsequent anodic etching were examined. X-ray photoelectron spectroscopy was used to study the chemical composition of depth analysis of the surface. Moreover, in order to examine the m...

2012
John M Nagarah Daniel A Wagenaar

Microfluidic and optical sensing platforms are commonly fabricated in glass and fused silica (quartz) because of their optical transparency and chemical inertness. Hydrofluoric acid (HF) solutions are the etching media of choice for deep etching into silicon dioxide substrates, but processing schemes become complicated and expensive for etching times greater than 1 hour due to the aggressivenes...

Journal: :Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 2016

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