Modified pyrimidine monophosphates such as methyl dCMP (mdCMP), hydroxymethyl dUMP (hmdUMP) and hmdCMP in some phages are synthesized by a large group of enzymes termed as thymidylate synthases (TS). Thymidylate is a nucleotide required for DNA synthesis and thus TS is an important drug target. In the biosynthetic pathway of the nucleoside fungicide mildiomycin isolated from Streptomyces rimofa...

Oxide CMP process is used in wafer fabrication to polish dielectric films. At the advance technology nodes, due to the complexity in the circuit design, CMP requirement has increased tremendously. Pattern density variations inside the die area increase especially in the big die size codes. It creates challenges for within die uniformity. Developing a cost effective process required high polish ...

It is widely reported that derivatives of sugar moieties can be used to metabolically label cell surface carbohydrates or inhibit a particular glycosylation. However, few studies address the effect of substitution of the cytidylmonophosphate (CMP) portion on sialyltransferase activities. Here we first synthesized 2'-O-methyl CMP and 5-methyl CMP and then asked if these CMP derivatives are recog...

the optimum fermentation times of black tea manufactured by two systems of orthodox and ctc (cut, tear & curl) were investigated by measuring the quality parameters of black tea, like: theaflavin, thearubigin, highly  polymerized substances and total liquid colour during the fermentation stage. optimum fermentation times from the beginning of fermentation were determined to be 60 min and 15...

In this research, we successfully expressed recombinant CMP-sialic Acid Synthetase (CSS) from Neisseria meningitides and 2,6-Sialyltransferase (SAT) from Photobacterium damsela in E. coli BL21(DE3) fermented at a scale of up to 8 litres using individual plasmids pIRL-1 and pIRL-4b, respectively. After cell lysis with BugBuster, enzyme levels of 2U and 22U per litre were produced for CSS and SAT...

We report on the development of a chemical mechanical planarization (CMP) process for thick damascene Ta structures with pattern feature sizes down to 100 nm. This CMP is core fabrication sequence scalable superconducting integrated circuits at 300 mm wafer scale. work has established elements various CMP-related design rules that can be followed by designer layout include Ta-based coplanar wav...