Dense machinable α-SiAlON/BN composites were fabricated by hot-pressing using turbostratic boron nitride (tBN) obtained from nitridation of melamine diborate. The tBN was added to the starting powders, or introduced as a coating that formed in situ on α-Si3N4 carrier powders during nitridation, and was subsequently converted to hexagonal boron nitride (hBN) during hot pressing by solution repre...

Refractory materials exhibit high damage tolerance, which is attractive for the creation of nanoscale field-emission electronics and optoelectronics applications that require operation at peak current densities optical intensities. Recent results have demonstrated properties titanium nitride, a refractory CMOS-compatible plasmonic material, can be tuned by adding silicon oxygen dopants. However...

Bioelectronic devices such as neural stimulation and recording require stable low-impedance electrode interfaces. Various forms of nitridated titanium are used in biointerface applications due to robustness biological inertness. In this work, stoichiometric TiN thin films fabricated using a dual Kaufman ion-beam source setup, without the necessity substrate heating. These layers remarkable comp...