A review is presented describing the development of TiN-CVD from the classical, high temperature T iClm2 process, towards low temperature MOCVD processes. This development is presented from a chemical point of view. In addition to low pressure (LPCVD) and atmospheric pressure (APCVD) thermal processing, also plasma enhanced (PECVD) techniques are described. In the past few years production faci...

During the chemical vapor deposition (CVD) growth of graphene on Cu foils, evaporation of Cu and changes in the dimensions of Cu grains in directions both parallel and perpendicular to the foils are induced by thermal effects. Such changes in the Cu foil could subsequently change the shape and distribution of individual graphene domains grown on the foil surface, and thus influence the domain s...

Iron oxide is a key multi-functional material in many different fields of modern technology. The β-Fe(2)O(3) cubic phase, one of the least studied Fe-O systems, was obtained by Chemical Vapor Deposition (CVD) using for the first time a Fe(II) β-diketonate diamine complex, Fe(hfa)(2)·TMEDA, as the molecular source (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate; TMEDA = N,N,N',N'-tetramethyleth...

We characterize heat dissipation of supported molybdenum disulfide (MoS 2 ) monolayers grown by chemical vapor deposition means ambient-condition scanning thermal microscopy (SThM). find that the boundary conductance MoS in contact with 300 nm SiO is around 4.6 ± MW m ?2 K ?1 . This value low range values determined for exfoliated flakes other techniques such as Raman thermometry, which span an...

Over the last decade non-thermal non-tumescent (NTNT) methods of truncal reflux elimination in chronic venous disease (CVD) are becoming increasingly popular. The main NTNT modalities mechanochemical ablation and cyanoacrylate adhesive closure (CAC). advantages avoidance tumescent anesthesia, low periprocedural pain bruising, high patient comfort satisfaction rates. CAC method has an additional...

Carbon containing zirconia films are deposited from chemical vapor deposition (CVD) and plasma enhanced (PECVD), as being used thermal barrier coatings for many applications. Their conductivity has been measured temperatures ranging room temperature up to 450 K using the 3 ω method. It is shown that samples exhibit a lattice an electronic contribution reaching values 13 W/m/K CVD 5 PECVD at K. ...

Edge structure and stability are crucial in determining both the morphology and the growth behaviours of hexagonal boron nitride (h-BN) domains in chemical vapour deposition (CVD) growth under near thermal equilibrium conditions. In this study, various edges of h-BN on three typical transition metal surfaces used for h-BN's CVD growth, Cu(111), Ni(111) and Rh(111), are explored with density fun...

In the last decade, catalytic chemical vapor deposition (CVD) has been intensively explored for growth of single-layer graphene (SLG). Despite scattering guidelines and procedures, variables such as surface texture/chemistry catalyst metal foils, carbon feedstock, process parameters have well-scrutinized. Still, questions remain on how best to standardize procedure. The possible correlation pro...

A numerical study has been performed modeling the gas-phase reactions occurring during the chemical vapor deposition ~CVD! of alumina from AlCl3 /CO2 /H2 mixtures. The purpose is to answer whether and to what extent trends in the decomposition of AlCl3 via gas-phase reactions can explain experimentally observed trends in CVD deposition of aluminum-containing films. The AlCl3 decomposition is pr...