نتایج جستجو برای: sputtering atoms
تعداد نتایج: 67393 فیلتر نتایج به سال:
0168-583X/$ see front matter 2009 Elsevier B.V. doi:10.1016/j.nimb.2009.01.057 * Corresponding author. Fax: +48 12 633 7086. E-mail address: [email protected] (L. Rzezn Molecular dynamics computer simulations have been employed to investigate the sputtering process of a benzene (C6H6) monolayer deposited on Ag{111} induced by an impact of slow clusters composed of large number of noble g...
The research presented in this summary was carried out by the author as part of his fourth-year group industrial project [1], in pursuit of the degree Master of Engineering in Mechanical Engineering at the University of Bristol. The project, Measurement of residual stress in heterogeneous materials, was conducted with three other students and consisted of experimental work at the microand macro...
Thin-film ruthenium (Ru) and copper (Cu) binary alloys have been prepared on a Teflon™ backing layer by cosputtering of the precious and nonprecious metals, respectively. Alloys were then selectively dealloyed by sulfuric acid as an etchant, and their hydrogen generation catalysts performances were evaluated. Sputtering time and power of Cu atoms have been varied in order to tailor the hydrogen...
Carbon thin films on SKD11 steel were deposited by 40 kHz frequency plasma sputtering technique using a waste of battery carbon rods in argon plasma, and their mechanical properties investigated various target-substrate distances (1 cm, 1.7 2 2.4 cm). The power used is 340 watts, the vacuum time 90 minutes, gas flow rate 80 ml/minute. deposition 120 minutes with initial temperature (temperature...
In this study, synthesis of CuS thin films on soda lime glass (SLG) substrates has been investigated. The method is based high vacuum post-sulphidation Cu deposited by rf. magnetron sputtering. Sputtering conditions have optimized so as to reduce grain size for better diffusion S atoms through boundaries. XRD pattern the precursor sample revealed fcc structure with an average crystallite 24 nm....
This investigation reports on the characteristics of MAPbI3 perovskite films on obliquely sputtered ITO/glass substrates that are fabricated with various sputtering times and sputtering angles. The grain size of a MAPbI3 perovskite film increases with the oblique sputtering angle of ITO thin films from 0° to 80°, indicating that the surface properties of the ITO affect the wettability of the PE...
We compare various sputtering simulation methods to experimental results in both the low energy (<1 keV) and high (?1 impact regimes for argon ions impacting a pure copper substrate at normal incidence. Our indicate that impacts, binary collision approximation (BCA) molecular dynamics can be used generate reasonable predictions yield distribution of sputtered atoms. also find agreement b...
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