The limitation of mechanical manufacturing will result in a small tilt angle the sample stage horizontal direction, which decreases spatial resolution imaging near-field scanning microwave microscopy (NSMM). In this paper, we focus on correction and improve NSMM image. results electromagnetic simulation line scan measurement demonstrate critical parameters affecting sensitivity NSMM, such as le...

The ability to fabricate structures from the microto the nanoscale with high precision in a wide variety of materials is of crucial importance to the advancement of microand nanotechnology and the nanosciences. The semiconductor industry has been pushing high-precision nanoscale lithography to manufacture ever-smaller transistors and higher-density integrated circuits (ICs). Critical issues, su...

A technique for synthesizing nanostructures by current lithography in a scanning tunneling microscope (STM lithography) layered Au/Si structures has been developed. An experimental dependence of the geometric dimensions created on time STM obtained. theoretical model growth is proposed, which explains nonlinear radius obtained with saturation region large radii. Keywords: nanostructures, lithog...

We present a method for submicron fabrication of flexible, thin-film structures fully encapsulated in biocompatible polymer poly (chloro-p-xylylene) (Parylene C) that improves feature size and resolution by an order of magnitude compared with prior work. We achieved critical dimensions as small as 250 nm by adapting electron beam lithography for use on vapor deposited Parylene-coated substrates...

4.1. Nanomachining with Scanning Probes 1831 4.2. Soft Lithography 1832 4.3. Embossing with Rigid Masters 1835 4.4. Near-Field Phase-Shifting Photolithography 1835 4.5. Topographically Directed Photolithography 1837 4.6. Topographically Directed Etching 1837 4.7. Lithography with Neutral Metastable Atoms 1838 4.8. Approaches to Size Reduction 1839 5. Techniques for Making Regular or Simple Patt...