نتایج جستجو برای: physical vapor deposition pvd
تعداد نتایج: 776219 فیلتر نتایج به سال:
– Multilayers like those used in giant magnetoresistive spin-valves can be improved if better layer thickness uniformity, lower contamination levels, reduced interfacial roughness and less interlayer mixing can be achieved. Atomistic simulations have revealed that optimization of the energy of the depositing atoms and the application of very low energy inert gas ion assistance reduce both inter...
double layer zno/sno2 thin film resistive gas sensors were fabricated by successive pvd of those oxides onto porcelain substrates. the metallic contacts were provided by electron beam evaporation of platinum onto substrates prior to deposition of the gas sensitive layers. deposits were thermally annealed at different temperatures. it was shown that the activation energy of electrical conduction...
For wafer sizes in state-of-the-art semiconductor manufacturing ranging up to 300 mm, the uniformity of processes across the wafer becomes a very important issue. We present a fully three-dimensional model for the feature scale simulation of continuum transport and reaction determined high-pressure chemical vapor deposition processes suitable for the investigation of such nonuniformities. The n...
Molybdenum disulphide (MoS2) thin films have received increasing interest as device-active layers in low-dimensional electronics and also as novel catalysts in electrochemical processes such as the hydrogen evolution reaction (HER) in electrochemical water splitting. For both types of applications, industrially scalable fabrication methods with good control over the MoS2 film properties are cru...
In the present work, a low-pressure chemical vapor deposition (LPCVD) Ti0.17Al0.83N and state-of-the-art arc ion plating PVD-Ti1−xAlxN (x = 0.25, 0.55, 0.60, 0.67) coatings were deposited on cemented carbide substrate. The morphological, structural, electrochemical properties of LPCVD-Ti0.17Al0.83N compared. X-ray diffraction (XRD) results scanning electron microscopy (SEM) images revealed that...
In the last decades an important number of research papers published on nano chip electrode and cathode electrochromic materials. Tantalum (Ta) with so high melting point can be as a good candidate for the future of nano chip devices. However, its surface has not enough trap centers and/or occupation states, so nitrogen ions exposed on Ta surafce, may solve this problem. For this purpose, in th...
Characterization of YSZ Coatings Deposited on cp-Ti Using the PS-PVD Method for Medical Applications
A patient’s body accepting a bone implant depends not only on the biomaterial used, but also its surface, which allows it to properly interact with cells. Therefore, research has focused improving bioactive and tribological properties of titanium alloys. Commercially pure (cp-Ti) is widely used as biomedical material. However, characterized by unsuitable properties. In this work, yttria-stabili...
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