Operation • Electrodeless inductive coupling allows use with chemically reactive gases • Low power (300 mW 3 W), low voltage (< 20 V) • Gas pressure: 0.1 10 Torr (13 1300 Pa) • Argon ion density: 1010 1011 cm-3 • Electron temperature: 20,000 50,000 K • Non-equilibrium plasma allows operation near room temperature, however. MEMS Plasma Generator A low power, electrodeless plasma source on a chip...