نتایج جستجو برای: magnetron sputtering
تعداد نتایج: 8959 فیلتر نتایج به سال:
Junaid Muhammad, Daniel Lundin, Justinas Palisaitis, Ching-Lien Hsiao, Vanya Darakchieva, Jens Jensen, Per Persson, Per Sandström, W-J Lai, L-C Chen, K-H Chen, Ulf Helmersson, Lars Hultman and Jens Birch, Two-domain formation during the epitaxial growth of GaN (0001) on c-planeAl2O3 (0001) by high power impulse magnetron sputtering, 2011, Journal of Applied Physics, (110), 123519. http://dx.doi...
Using plasma in conjunction with fluorinated compounds is widely encountered in material processing. We discuss several plasma techniques for surface fluorination: deposition of fluorocarbon thin films either by magnetron sputtering of polytetrafluoroethylene targets, or by plasma-assisted chemical vapor deposition using tetrafluoroethane as a precursor, and modification of carbon nanowalls by ...
I Abstract The present thesis focuses on carbon-based thin films prepared by high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). Carbon nitride (CN x : 0 < x < 0.20) as well as carbon fluoride (CF x : 0.04 < x < 0.35) thin films were synthesized in an industrial deposition chamber by reactive magnetron sputtering of graphite in Ne/N 2 , Ar/N 2 , Kr/N...
The transition metal nitrides like titanium nitride exhibit very interesting color variation properties depending on the different plasma deposition conditions using cylindrical magnetron sputtering method. It is found in this deposition study that nitrogen partial pressure in the reactive gas discharge environment plays a significant role on the color variation of the film coatings on bell-met...
Copper films of 300 nm thickness deposited by planar magnetron sputtering on glass substrates, for substrate temperatures between 300 and 500 K, and deposition rate of 10 ?s?1. Microstructure of these films was obtained by X-ray diffraction, while the texture mode of diffractometer was used for stress measurement by the sin2? technique. The components of the stress tensor are obtained using mea...
We report the discovery of a face-centered cubic (Al1-xCrx)2O3 solid solution [0.60 preferred orientation and exhi...
The corrosion behavior of TiN coated 316L stainless steel in an artificial physiological solution was investigated by means of an electrochemical test. Two different PVD methods were used for film deposition: cathodic arc and reactive magnetron sputtering. The dependence of the corrosion resistance on the main deposition parameters (nitrogen pressure, substrate bias) was analyzed. For a better ...
Amorphous Ni–Ag films were obtained on liquid nitrogen cooled Si substrates using DC magnetron sputtering. A series of magnetic and magneto-transport property measurements confirm that the film with Ni to Ag atomic ratio of 60:40 is an alloy of the two elements immiscible in equilibrium, with atomic-level intermixing. The magnetic properties of the new alloy are discussed in comparison with tho...
The structure and nanoscale mechanical properties of Ni48.8Mn27.2Ga24 thin film fabricated by DC magnetron sputtering are investigated systematically. The thin film has the austenite state at room temperature with the L21 Hesuler structure. During nanoindentation, stress-induced martensitic transformation occurs on the nanoscale for the film annealed at 823 K for 1 hour and the shape recovery r...
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