Novel chemical vapor deposition (CVD) process was successfully developed for the growth of Sr2Si5N8:Ce3+ phosphors with elevated luminescent properties. Metallic strontium was used as a vapor source for producing Sr3N2 vapor to react with Si3N4 powder via a homogeneous gas-solid reaction. The phosphors prepared via the CVD process showed high crystallinity, homogeneous particle size ranging fro...

The chemical vapor deposition (CVD) of silicon carbide from vinyltrichlorosilane (VTS) was studied to identify a range conditions leading pure crystalline SiC. rate recorded evidence the various regimes. Gas phase, elemental analyses and infiltration tests were also performed. Three distinct reaction regimes identified. In CVD conditions, carbon is co-deposited at low temperature while VTS only...

Polycrystalline diamond (PCD) films are usually grown by chemical vapor deposition (CVD) in hydrogen–methane mixtures. The synthesis conditions determine the structure and quality of material. Here, we report complex effect microwave plasma CVD on morphology, growth rate phase composition resulting PCD films. Specifically, focus factors (i) increased methane concentrations (νc) that varied over...

The electrical properties of MIS structures with silicon oxynitride films, deposited at 200 C in a RF-plasma CVD reactor using Si(OC2H5)4 (TEOS) as a precursor and nitrogen as the gas ambient have been studied. The analysis of the capacitance-voltage and current–voltage characteristics has shown that a larger DC bias yields larger densities of dielectric charge and interface traps in the growin...

BN has been deposited with plasma enhanced CVD using borane dimethyl amine and NH3. The resulting layers are stable in air, although they contain an excess of boron, the actual amount depending on the deposition conditions. The presence of relatively large amounts of carbon in the layers indicates the incomplete decomposition of the organic fragment. Generally the layers posses the turbostratic...

Graphene, firstly isolated in 2004, is a new type of carbon materials, which contains a singleor few-layered sheet of Sp2-bonded carbon atoms. This special atomic structure gives graphene rich physical properties and wide potential applications. It has excellent electrical, mechanical, thermal and optical properties and has wide applications in nanoeletronic devices, transparent conductive film...

In the last decade, catalytic chemical vapor deposition (CVD) has been intensively explored for growth of single-layer graphene (SLG). Despite scattering guidelines and procedures, variables such as surface texture/chemistry catalyst metal foils, carbon feedstock, process parameters have well-scrutinized. Still, questions remain on how best to standardize procedure. The possible correlation pro...

Abstract Rate coefficients for elementary reactions connected to the potential energy wells of SiHCl 3 , SiH 2 Cl and Cl, which are important Si 1 species in chemical vapor deposition (CVD) processes that use chlorosilanes as silicon source gases, were determined through Rice–Ramsperger–Kassel–Marcus (RRKM) theory various conditions temperature pressure. Many unimolecular decomposition channels...