16 Multilayered structures with 14 to 50 nm periods composed of titanium and two different 17 titanium oxides, TiO and TiO2, were accurately produced by DC magnetron sputtering 18 using the reactive gas pulsing process (RGPP). Structure and composition of these 19 periodic TiO2/TiO/Ti stacks were investigated by X-ray diffraction (XRD) and 20 transmission electronic microscope (TEM) techniques....

DLC coatings are deposited on aluminium substrates to improve the wear resistance property of using sputtering deposition in this study. graphite target onto Al5051 DC sputtering. The then analyzed for their adhesion strength, hardness, coefficient friction, and chemical compositions. pin-on-disk method is conducted vacuumed conditions, dry air conditions (0% RH), ambient (40% RH). different te...

Using DC-Plasma Enhanced Chemical Vapour Deposition (PECVD) system, the impact of pure Co onthe growth of diamond-like carbon (DLC) nano-structures were investigated. In this study, Acetylene(C2H2) was diluted in H2 and used as the reaction gas and Cobalt (Co) nano-particles were used asthe catalyst. The effect of preparing Co catalyst at temperatures of 240°C and 350°C and growthconditions was...

Using C2H2, 112 and As gases at 550'C, carbon nanotubes were fabricated on the surfaces of twosubstrates coated by nano thin layers of metal catalysts by DC magnetron sputtering. AYStamless steel andFe/CteAl, by thermal chemical vapor deposition (TCVD) The surface properties of the substrates wereparticularly investigated, and the effect of treatment of the substrates on the CNT's growth is cri...

Reactive sputtering of aluminum oxide in a planar magnetron system is conducted with a mixture of O and Ar reacting with 2 and bombarding an aluminum target. The aluminum target is powered by a pulsed directed current (DC) bias which functions to discharge the accumulated ions on the insulating AlO film surface during the positive duty cycle and suppresses arc formation. x A seven-turn helical ...

Abstract Effects of sputtering power on the deposition rate and microstructure, crystallinity, electrical properties Ag films during direct current (DC) magnetron are investigated. Thin (~ 100 nm) deposited at powers 10, 20, 50, 100, 200 300 W analyzed by field-emission scanning electron microscopy (FESEM), X-ray diffraction (XRD), transmission (TEM) a four-point probe. The film 10 has lowest g...

The 200-nm thick TiN films used in this work were grown on c-sapphire substrates (GT Crystal Systems, LLC, USA) using DC reactive magnetron sputtering. The deposition was performed in Ar-N2 atmosphere with a pressure of 5mTorr and gas flow rates of Ar and N2 being 4 and 6 sccm, respectively. During the deposition, the substrates were maintained at 800oC and the deposition rate was kept at appro...

We report a study of the optical and electric properties of Au nanoparticle networks grown on the porous alumina membrane by dry atom sputtering deposition approach. An effective cluster model was developed to evaluate the dielectric function and the electrical conductivities of the nanoparticle networks by taking into account the effects of the Au particle size, the Au volume fraction, and the...

a-axis-oriented planes perpendicular to the substrates) and multilayers have been grown by dc sputtering on (100) susbstrates and characterized by the refinement of the structure from x-ray spectra. The results show that interfacial structure (thickness fluctuations, interdiffusion, etc.) of the a axis are similar to the c-axis oriented superlattices. The angular dependence of the resistivity i...