Ferroelectric field-effect transistors (Fe-FETs) with ferroelectric hafnium oxide (FE HfO2) as gate insulator are being extensively explored a promising device candidate for three-dimensional (3D) NAND memory application. FE HfO2 exhibits long retention over 10 years, high endurance 1012 cycles, speed sub-ns polarization switching, and remnant of 10-30 {\mu}C/cm2. However, the performance Fe-FE...