نتایج جستجو برای: خمیر cmp سپیدار

تعداد نتایج: 4607  

Journal: :Cancer research 2002
Jieh-Yuan Liou Ginger E Dutschman Wing Lam Zaoli Jiang Yung-Chi Cheng

Pyrimidine nucleoside monophosphate kinase [UMP/CMP kinase (UMP/CMPK);EC 2.7.4.14] plays a crucial role in the formation of UDP, CDP, and dCDP, which are required for cellular nucleic acid synthesis. Several cytidine and deoxycytidine analogues are important anticancer and antiviral drugs. These drugs require stepwise phosphorylation to their triphosphate forms to exert their therapeutic effect...

Journal: :ECS Journal of Solid State Science and Technology 2022

As a crucial substrate material for optoelectronic materials, sapphire has important applications in both military and civilian fields. In order to achieve the final processing quality of double-sided chemical mechanical polishing (DS-CMP) is necessary process, which also guarantee preparation high-end LED chips. this article, DS-CMP plan based on Box-Behnken design obtained experimented. Then,...

2011
David W. Embley Stephen W. Liddle Oscar Pastor

In order to promote Conceptual-Model Programming (CMP), we set forth these CMP Articles. We hold these articles to be the defining principles for model-complete software development. In essence, this CMP manifesto asserts that programming activities are to be carried out via conceptual modeling. For applications amenable to conceptual-model designs, software developers should never need to writ...

ربیع بهروز, سمیه قاسمی

امروزه استفاده از درصد خشکی بالا به­ویژه در واحد رنگبری خمیرکاغذ به دلیل صرفه ­جویی قابل ملاحظه در مصرف انرژی و آب فرایندی و کاهش قابل توجه حجم پساب خروجی از کارخانه به­شدت مورد توجه صنایع خمیر و کاغذ قرار گرفته است. به­طوری­که، این تحقیق با هدف بررسی اثر درصد خشکی در رنگبری خمیرکاغذ شیمیایی-مکانیکی(CMP) مخلوط پهن برگان با پراکسید هیدروژن انجام گردید. بدین­ترتیب مرحله پیش­تیمار Qبه منظور حذف یو...

Journal: :Applied sciences 2021

Chemical–mechanical polishing (CMP) is a process that planarizes semiconductor surfaces and essential for the manufacture of highly integrated devices. In CMP, pad conditioning using disk with diamond grit adopted to maintain surface roughness remove debris. However, uneven wear by unavoidable in CMP. this study, we propose contact-area-changeable system utilize it conduct preliminary study imp...

Journal: :Glycobiology 2008
Sing Fee Lim May May Lee Peiqing Zhang Zhiwei Song

A CHO mutant line, MAR-11, was isolated using a cytotoxic lectin, Maackia amurensis agglutinin (MAA). This mutant has decreased levels of cell surface sialic acid relative to both wild-type CHO-K1 and Lec2 mutant CHO cells. The CMP-sialic acid transporter (CMP-SAT) gene in the MAR-11 mutant cell has a C-T mutation that results in a premature stop codon. As a result, MAR-11 cells express a trunc...

2017
Rosemarie M Bowler Shane W Adams Ralf Schwarzer Vihra V Gocheva Harry A Roels Yangho Kim Catherine L Kircos Chris W Wright Michelle Colledge George Bollweg Danelle T Lobdell

BACKGROUND This study investigated the validity of self-reported concentration and memory problems (CMP) in residents environmentally exposed to manganese (Mn). METHOD Self-report of CMP from a health questionnaire (HQ) and the Symptom Checklist-90-Revised (SCL-90-R) was compared to neuropsychological assessment (Trails A&B; Digit Span; Digit Symbol; Similarities; Auditory Consonant Trigrams,...

2010
Suresh Siddha Venkatesh Pallipadi Asit Mallick

Recent advances in semiconductor manufacturing and engineering technologies have led to the inclusion of more than one CPU core in a single physical processor package. This, popularly known as Chip Multi Processing (CMP), allows multiple instruction streams to execute at the same time. CMP is in addition to today’s Simultaneous Multi Threading (SMT) capabilities, like Intel R © Hyper-Threading ...

2003
Lixin Su Karthik Ramachandran

Our project starts from investigating if instruction-based sharing exists on commercial workloads such as Apache, Zeus, Jbb, and Oltp running on CMPs. We find that there is a large amount of instruction-based sharing on CMPs. Constructive interference at the instruction cache miss level also exists among different CMP cores. We further study if the implementation of a shared Markov table can he...

Journal: : 2022

The research methods and the first results obtained in study of roughness single-crystal silicon (111) substrates processed at final stage by various are described: traditional polishing without use chemical-mechanical (CMP), with CMP CMP, but oxide cerium nanopowders. efficiency using CeO 2 nanopowders has been demonstrated. following effective values were obtained: - 3.56 nm, 0.54 0.93 nm. Ke...

نمودار تعداد نتایج جستجو در هر سال

با کلیک روی نمودار نتایج را به سال انتشار فیلتر کنید