A statistical metrology framework is used to identify systematic and random sources of interconnect structure (ILD thickness) variation. Electrical and physical measurements, TCAD simulations, design of experiments, signal processing, and statistical analysis are integrated via statistical metrology to deconvolve ILD thickness variation into constituent variation sources. In this way, insight i...

65 nm and 45 nm silicon devices will utilize compositionally critical processes for gate dielectrics, capacitor dielectrics, gate and capacitor electrodes, and ultra shallow junction layers. For example, small changes in nitrogen composition have been correlated with unacceptable shifts in electrical properties of devices with SiOxNy gate dielectrics. Present optically-based metrology technolog...

We present a highly miniaturized camera, mimicking the natural vision of predators, by 3D-printing different multilens objectives directly onto a complementary metal-oxide semiconductor (CMOS) image sensor. Our system combines four printed doublet lenses with different focal lengths (equivalent to f = 31 to 123 mm for a 35-mm film) in a 2 × 2 arrangement to achieve a full field of view of 70° w...

INTRODUCTION Often in manufacturing, visual inspectors are used to approve the correctness of a free form surface‟s cosmetic or functional characteristics. While the human‟s adaptive interpretation allows flexibility where standard vision systems fail, the human inspection process remains highly subjective and inconsistent between inspectors. This can be problematic for manufacturing due to the...

All relevant key techniques involved in photogrammetric vision metrology for fully automatic 3D measurement of large-scale structure are studied. A new kind of coded target consisting of circular retroreflective discs is designed, and corresponding detection and recognition algorithms based on blob detection and clustering are presented. Then a three-stage strategy starting with view clustering...

In classical estimation theory, the central limit theorem implies that the statistical error in a measurement outcome can be reduced by an amount proportional to n by repeating the measures n times and then averaging. Using quantum effects, such as entanglement, it is often possible to do better, decreasing the error by an amount proportional to n. Quantum metrology is the study of those quantu...

This paper demonstrates the application of two methods of separating spindle error motion from artifact roundness on a spindle with less than five nanometers radial error. Two error separation methods, reversal and multiprobe, were each applied to data taken on two different test stands allowing direct comparison of the four combinations of hardware and separation algorithm. Because the theory ...

Fleming, Leigh, Blunt, Liam, Robbins, David and Elrawemi, Mohamed (2013) Characterisation techniques to assess functional properties of barrier coatings for flexible PV substrates. In: Proceedings of Laser Metrology and Performance X 10th International Conference and Exhibition on Laser Metrology, Machine Tool, CMM & Robotic Performance. LAMDAMAP 2013 . EUSPEN, Buckinghamshire, UK, pp. 59-69. I...

This paper investigates the location of a rigid body such that N specified points of the body lie on N given planes in space. Variants of this problem arise in kinematics, metrology, and computer vision, including some, such as the motion of a spherical four-bar, that are not at first glance point-plane contact problems. The case N = 6, the minimum number to fully constrain the body, is of spec...