This work investigated the microstructure and mechanical property of high-boron multi-component alloy with Fe, B, C, Cr, Mo, Al, Si, V, Mn different contents Ti. The results indicate that as-cast metallurgical alloys consist ferrite, pearlite borocarbide. In an un-modified alloy, continuous reticular structure borocarbide is observed. After titanium addition, changes into a fine isolated morpho...

The study of metal poor stars provides clarification and knowledge about the primordial Universe. Specially, halo provide explanations nature first generations nucleosynthesis in metal-poor regime. We present a detailed chemical analysis determination kinematic orbital properties two characterized by high speed with respect to Sun. analyzed high-resolution Subaru spectra employing MyGIsFOS code...

In this investigation PVD Ti-Cr)N coatings were deposited on hardened and tempered tool steel substrates using reactive arc evaporation. Physical and mechanical properties of coatings such as roughness, thickness, phase composition, hardness and modulus young and coefficient friction were evaluated. Phase compositions were studies by X-ray diffraction method. The surface microstructure and morp...

Silicon nitride (Si(3)N(4)) is an industrial ceramic used in spinal fusion and maxillofacial reconstruction. Maximizing bone formation and minimizing bacterial infection are desirable attributes in orthopedic implants designed to adhere to living bone. This study has compared these attributes of Si(3)N(4) implants with implants made from two other orthopedic biomaterials, i.e. poly(ether ether ...

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Backscattering spectrometry, Auger electron spectroscopy, and x-ray diffraction have been used to monitor the thin-film reactions and nitrogen redistribution in the (Si)/Ti!W-N/Al metallization system. It is found that nitrogen in the W-N layer redistributes into Ti after annealing at temperatures above 500 oc. As a consequence of this redistribution of nitrogen, a significant amount ofinterdif...

Film growth rates during DCMS and HIPIMS sputtering in Ar are measured for ten technologically-relevant elemental target materials: Al, Si, Ti, Cr, Y, Zr, Nb, Hf, Ta, and W, spanning wide range of masses, ionization energies, and sputter yields. Surprisingly, the ratio of power-normalized HIPIMS and DCMS rates α decays exponentially with increasing peak target current density JJTT for all metal...

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