We have developed a wireless-controlled compact optical switch by siliconmicromachining techniques with DC magnetron sputtering. For the optical switchingoperation, micro mirror is designed as cantilever shape size of 5mm×800μm×50μm.TbDyFe film is sputter-deposited on the upper side of the mirror with the condition as: Argas pressure below 1.2×10-9 torr, DC input power of 180W and heating tempe...

Au/Cu metallic films were deposited on p-Si(100) substrates with and without an Au upper layer by magnetron sputtering. The defect formation and nanoscale interfacial evolution at the Au/Cu and Cu/Si interfaces were studied by using Auger electron spectroscopy (AES) and high resolution transmission electron microscopy (HRTEM). The results showed that an increase in defects at the heterointerfac...

Aluminum doped diamond-like carbon (DLC:Al) thin films were deposited on n-Si(100) substrates by co-sputtering a graphite target under a fixed DC power (650 W) and an aluminum target under varying DC power (10-90 W) at room temperature. The structure, adhesion strength and surface morphology of the DLC:Al films were characterized by X-ray photoelectron spectroscopy (XPS), micro-scratch testing ...

Optical constants and roughness study of dc magnetron sputtered iridium films" (2002). Faculty Publications from the Department of Electrical and Computer Engineering. 5. Extremely smooth thin films of iridium have been deposited onto superpolished fused silica substrates using dc magnetron sputtering in an argon plasma. The influence of deposition process parameters on film microroughness has ...

Sources on interface magnetization and anisotropy in Fe/Cu multilayers have been investigated via thermal behavior using DC magnetization and ferromagnetic resonance techniques. The samples were prepared by DC sputtering resulting in equal thickness elemental layers ranging in modulation wavelength from 1 to 30 nm. The interface anisotropy remains nearly constant at 0.32 erg/cm2 through the tem...

Diamond-like carbon (DLC) thin films used in this study were prepared with DC magnetron sputtering deposition. Silicon (100) wafers were used as the substrates onto which an RF bias was applied during the film deposition. For the nitrogen doped DLC films, a pure graphite target was used as the carbon source and nitrogen gas was introduced into the deposition chamber via a mass flow controller. ...

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