Background: The purpose of this study was to compare and evaluate the effects of metal primer on the shear bond strength of denture base resin to base metal alloy after electrolytic and laser etching. Materials and Methods: A total of 48 cobalt‐chromium (Co‐Cr) alloy specimens were fabricated. The specimens were divided into 6 groups of 8 specimens each. Group I: Sandblasting (control group). G...

Creating high aspect ratio (AR) nanostructures by top-down fabrication without surface damage remains challenging for III-V semiconductors. Here, we demonstrate uniform, array-based InP nanostructures with lateral dimensions as small as sub-20 nm and AR > 35 using inverse metal-assisted chemical etching (I-MacEtch) in hydrogen peroxide (H2O2) and sulfuric acid (H2SO4), a purely solution-based y...

A combination of template-assisted metal catalytic etching and self-limiting oxidation has been successfully implemented to yield core-shell silicon nanowire arrays with inner diameter down to sub-10 nm. The diameter of the polystyrene spheres after reactive ion etching and the thickness of the deposited Ag film are both crucial for the removal of the polystyrene spheres. The mean diameter of t...

A multiple deposition and etching process has been developed to enable high fill factor boron deposition in high aspect ratio holes fabricated in a (100) silicon substrate. The boron deposition was carried out using low-pressure chemical vapor deposition and the etching was done by inductively coupled plasma reactive ion etching technique. The boron deposition processes were carried out under d...

Random surface roughness very often can occur during the growth or etching of films under non-equilibrium conditions. Several competing mechanisms such as noise, surface diffusion, and shadowing all play a role in the evolution of surface roughness. However, recent results obtained in many growth and etching processes exhibit an unusual tendency: the morphology is very rough where it is expecte...