نتایج جستجو برای: acid etchant

تعداد نتایج: 747686  

2007
Johann Cervenka Hajdin Ceric Otmar Ertl Siegfried Selberherr

In MEMS fabrication micro-mechanical components have to be partially released from a substrate. Selectively etching away sacrificial layers, such that a free standing structure remains, is a widely used technique for this purpose. Free standing structures allow MEMS devices to induce or to sense mechanical movements or vibrations. During sacrificial etching lower etch rates than the blanket one...

2009
Simon Garcia

A micromachined test structure was used to measure the etch rate of silicon in potassium hydroxide (KOH) as a function of surface orientation, which quantifies etchant anisotropy. By adding multidentate ligands, containing hydroxyl groups, to etchant solutions, the effects of these ligands on etch rate were determined. Bidentate ligands 1,2-ethanediol, 1,3-propanediol, and 1,4-butanediol each s...

Journal: :Dental materials : official publication of the Academy of Dental Materials 2005
Paula Jacques Josimeri Hebling

OBJECTIVE To investigate the effect of different dentin treatments on the microtensile bond strength of a self-etching primer and a simplified, total-etch adhesive system. METHODS Flat dentin surfaces were created on extracted human third molars. The surfaces were treated with one of the following conditioners: self-etching primer for 20 s (Clearfil SE Primer), 37% phosphoric acid for 15 s or...

2009
Usha Mohan Das Suma G

Dental adhesive systems used for bonding dental resins to enamel and dentin have evolved through several "generations," with changes in chemistry, mechanism, number of bottles, application technique, and clinical effectiveness. The trend in the latest generation of dental bonding systems is to reduce the number of components and clinical placement steps. The introduction of i bond, a single-bot...

Journal: :Lab on a chip 2009
Xuan Mu Qionglin Liang Ping Hu Kangning Ren Yiming Wang Guoan Luo

A new method of anisotropic etching an amorphous bulk material is proposed in this paper. Laminar flow is employed in this method to mask the flow of an etchant and is termed as "liquid etch mask". Since this mask has the physical properties of a liquid, it brings several advantages that could not be achieved by any kind of other etch mask in the solid phase. As a consequence, the aspect ratio ...

Journal: :Nano letters 2005
Yujie Xiong Jingyi Chen Benjamin Wiley Younan Xia Yadong Yin Zhi-Yuan Li

Pd nanocubes between 8 and 50 nm in size were synthesized at the same concentration of Na2PdCl4 precursor by controlling the number of seeds formed in the nucleation stage. Increasing the concentration of FeCl3, an oxidative etchant for Pd, reduced the number of seeds and led to formation of larger Pd nanocubes. The larger nanocubes exhibited surface plasmon resonance peaks in the visible regio...

Journal: :Dental materials : official publication of the Academy of Dental Materials 2007
K Hikita B Van Meerbeek J De Munck T Ikeda K Van Landuyt T Maida P Lambrechts M Peumans

OBJECTIVES The bonding effectiveness of five adhesive luting agents to enamel and dentin using different application procedures was determined using a micro-tensile bond strength protocol (microTBS). METHODS Enamel/dentin surfaces of human third molars were flattened using a high-speed diamond bur. Composite resin blocks (Paradigm, 3M ESPE) were luted using either Linkmax (LM; GC), Nexus 2 (N...

2009
Mohan Das Usha Mohan Das

Dental adhesive systems used for bonding dental resins to enamel and dentin have evolved through several “generations,” with changes in chemistry, mechanism, number of bottles, application technique, and clinical effectiveness. The trend in the latest generation of dental bonding systems is to reduce the number of components and clinical placement steps. The introduction of i bond, a single-bot...

Journal: :Nano letters 2011
Matt DeJarld Jae Cheol Shin Winston Chern Debashis Chanda Karthik Balasundaram John A Rogers Xiuling Li

Periodic high aspect ratio GaAs nanopillars with widths in the range of 500-1000 nm are produced by metal-assisted chemical etching (MacEtch) using n-type (100) GaAs substrates and Au catalyst films patterned with soft lithography. Depending on the etchant concentration and etching temperature, GaAs nanowires with either vertical or undulating sidewalls are formed with an etch rate of 1-2 μm/mi...

2003
C.W.Y. Yip J.P.Y. Ho V.S.Y. Koo D. Nikezic K. N. Yu

The e ects of stirring on the bulk etch rate of LR 115 detector has been investigated. The surface pro6le measurement method using an instrument called Form Talysurf has been used to measure the thickness of the active layer of the LR 115 detectors. The etchant was 10% aqueous solution of NaOH maintained at 60◦C. The bulk etch rate under magnetic stirring has been found to be 6:65 ± 0:34 m h−1 ...

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