نتایج جستجو برای: thermal chemical vapor deposition

تعداد نتایج: 673952  

2007
Abhishek Prasad Samuel Mensah Jiesheng Wang Archana Pandey Yoke Khin Yap

The growth of ZnO nanotubes and nanosquids is obtained by conventional thermal chemical vapor deposition (CVD) without the use of catalysts or templates. Characterization of these ZnO nanostructures was conducted by X-ray powder diffraction (XRD), field-emission scanning electron microscopy (FESEM), Raman spectroscopy, and photoluminescence (PL). Results indicate that these ZnO nanostructures m...

2000
Sung-Wook Chung Jae-Young Yu James R. Heath

Transport measurements were carried out on 15–35 nm diameter silicon nanowires grown using SiH4 chemical vapor deposition via Au or Zn particle-nucleated vapor-liquid-solid growth at 440 °C. Both Al and Ti/Au contacts to the wires were investigated. The wires, as produced, were essentially intrinsic, although Au nucleated wires exhibited a slightly higher conductance. Thermal treatment of the f...

2005
R. J. Narayan R. L. Snyder Jenny R. Morber

2003
Q. TANG H. ALBERS A. DRIESSEN L. T. H. HILDERINK P. V. LAMBECK J. A. POPMA

Fine-grain thin superconducting films can be prepared by metalorganic Chemical Aerosol Deposition Technology (CADT). In this paper, we present the preparation and properties of YBa2Cu307_ x films on the different substrates, Si and SrTiO 3 (100). It is shown that the zero-resistance temperature (Tc,0) of the films on SrTiO 3 substrates is about 90 K, and the critical current density (Jc) at 77 ...

2010
Yang Liu Chai Lor Qiang Fu David Pan Lei Ding Jie Liu Jennifer Lu

Self-assembled solution micelles prepared from polystyrene-b-poly(4-vinylpyridine) (PS-b-P4VP) and polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP), have been employed as templates to synthesize copper nanocatalysts which are regarded as an excellent catalyst system for 1D nanomaterial synthesis. We have demonstrated that uniform-sized nanoparticles with diameters ranging from 1 to 15 nm have be...

2007
S. E. Alexandrov

Some aspects of RF remote plasma enhanced CVD including the main features of the technique, possibilities of overcoming disadvantages typical for conventional plasma processes, and possible directions to improve the remote plasma method are discussed.

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