The spin-orbit interaction (SOI) of a two-dimensional hole gas in the inversion symmetric semiconductor Ge is studied in a strained-Ge/SiGe quantum well structure. We observe weak antilocalization (WAL) in the magnetoconductivity measurement, revealing that the WAL feature can be fully described by the k-cubic Rashba SOI theory. Furthermore, we demonstrate electric field control of the Rashba S...

Silicon-on-insulator (SOI) has been used as a platform for near-infrared photonic devices for more than twenty years. Longer wavelengths, however, may be problematic for SOI due to higher absorption loss in silicon dioxide. In this paper we report propagation loss measurements for the longest wavelength used so far on SOI platform. We show that propagation losses of 0.6-0.7 dB/cm can be achieve...

Ultra Thin Body (UTB) SOI are promising alternatives for extending the MOSFET scaling. However, intrinsic parameter fluctuations still remains as one of the major challenges for the ultimate scaling and integration of UTB SOI MOSFETs. In this paper, using 3D statistical numerical simulations we investigate the impact of random discrete dopants, body thickness variations and line edge roughness ...

We have simultaneously fabricated RF power LDMOSFETs on thin-film SOI and bulk silicon wafers. This work compares their DC current–voltage ( – ), capacitance–voltage ( – ), -parameter, and 1.9-GHz load-pull characteristics and explains differences between them. The SOI LDMOSFET performance is shown to be largely similar to the performance of an equivalent bulk silicon LDMOSFET, but there are im...

For the first time, we report the combined application of a SiGe source and a delta-doped + region in a PD SOI MOSFET to minimize the impact of floating body effect on both the drain breakdown voltage and the single transistor latch. Our results demonstrate that the proposed SOI structure exhibits as large as 200% improvement in the breakdown voltage and is completely immune to single transisto...

One important trend in recent years is the reduction of the silicon film thickness in SOI devices. As results of scaling this parameter several benefits have been obtained such as the elimination of the kink effect, the suppression of short-channel effects, improved subthreshold characteristics, the enhancement of carrier mobility, suppression of punchthrough and drain current overshoot and so ...

A low-power 435-MHz single-ended low-noise amplifier was implemented in a 0.35-μm silicon on insulator (SOI) CMOS technology. The SOI CMOS LNA has a simulated noise figure of 0.6 dB, input 1-dB compression point of –12.5 dBm, input thirdorder intercept point of –5 dBm, and small-signal gain of 22 dB. Total power dissipation is 10 mW from a 2.5-V supply. LNA chip area is 1.4 mm x 0.58 mm. Due to...

Topological insulator (TI) states have been demonstrated in materials with a narrow gap and large spin-orbit interactions (SOI). Here we demonstrate that nanoscale engineering can also give rise to a TI state, even in conventional semiconductors with a sizable gap and small SOI. Based on advanced first-principles calculations combined with an effective low-energy k · p Hamiltonian, we show that...

A cyclic A/D conversion circuit technique for sensor networks has been developed using 0.2-μm CMOS/FD-SOI technology. The FD-SOI analog switches can lower the supply voltage without degrading accuracy because of their negligible body effect. The proposed A/D converter achieves operation at the supply voltage of 1 V or less and can handle a sampling frequency ranging from 8 Sps to 8 kSps with a ...