نتایج جستجو برای: sacrificial

تعداد نتایج: 2160  

2006
R. Hellin-Rico J.-P. Celis K. Baert C. Van Hoof A. Witvrouw

This paper presents the different processing steps of a new generic surface micromachining module for MEMS hermetic packaging at temperatures around 180°C based on nickel plating and photoresist sacrificial layers. The advantages of thin film caps are the reduced thickness and area consumption and the promise of being a lowcost batch process. Moreover, sealing happens by a reflow technique, giv...

Journal: :CoRR 2006
R. Hellin-Rico J.-P. Celis K. Baert Chris Van Hoof Ann Witvrouw

This paper presents the different processing steps of a new generic surface micromachining module for MEMS hermetic packaging at temperatures around 180°C based on nickel plating and photoresist sacrificial layers. The advantages of thin film caps are the reduced thickness and area consumption and the promise of being a lowcost batch process. Moreover, sealing happens by a reflow technique, giv...

2008
Garrett D. Cole Elaine Behymer Lynford L. Goddard Tiziana C. Bond

The authors present a simplified fabrication method for the creation of free-standing dielectric mirrors for use in monolithic wavelength tunable surface-normal photonic devices, including vertical-cavity surface emitting lasers. This process utilizes a nonplasma dry etching process, based on the noble gas halide, xenon difluoride XeF2 , to remove an inorganic sacrificial film comprised of low-...

2000
Byong-Ho Park Fritz B. Prinz

Shape Deposition Manufacturing (SDM) is a layered manufacturing process capable of building complex 3D parts through the combination of material addition and subtraction. Overhangs can be built with the help of sacrificial support materials. SDM achieves high surface quality by taking advantage of material subtraction by CNC machining. High surface quality in turn enables the fabrication of pre...

2016
Liang Tang Yuefeng Wang Gary Cheng Michael Manfra Timothy Sands Michael J. Manfra Timothy D. Sands

In this work, we present a method able to fabricate thin GaN nanomembranes fit for device applications. Starting from commercial GaN on sapphire substrates, MBE was used to deposit a sacrificial layer, which comprises of a superlattice of InN/InGaN, after which thin a GaN film of hundreds of nanometers thickness was grown on top. Pulsed laser irridiation with photon energy of 2.3eV gives rise t...

2011
Jian Zhang Bo Cui Haixiong Ge

0167-9317/$ see front matter 2011 Elsevier B.V. A doi:10.1016/j.mee.2010.12.107 ⇑ Corresponding author. E-mail address: [email protected] (J We fabricated molds consisting of features in rigid UV-cured resist on an elastic poly(dimethylsiloxane) (PDMS) support for hybrid nanoimprint-soft lithography. The molds were duplicated through coating and curing a UV-curable resist onto a pol...

2014
Nursabirah Jamel Dibin Zhu Ahmed Almusallam Russel Torah Kai Yang Steve P. Beeby John Tudor

This paper reports the design, fabrication and testing of a free-standing encastre beam resonator which is entirely fabricated using screen printing onto a flexible polyimide substrate. The design of the free-standing resonator was achieved using sacrificial techniques. The resonator was designed to be excited at one end of the beam and the vibrations detected on the other end using piezoelectr...

2015
Tan T. Vu Gregorio Marbán

Standard sacrificial template synthesis allows metal oxide nanotubes to be produced from ZnO nanowires. In spite of their high interest in several technological fields, the low surface area of these nanotubes is a drawback for most applications. Here we report for the first time the sacrificial template synthesis of stainless steel wire-mesh (SSWM) supported metal oxides of high technological i...

2015
Hoon Lee Tae Il Lee Su Jeong Lee Jae Min Myoung

In order to manufacture short gap single Si nanowire (NW) field effect transistor (FET) by imprinting and transferring method, we introduce the method using Al2O3 sacrificial layer. The diameters of cylindrical Si NW addressed between Au electrodes by dielectrophoretic (DEP) alignment method are controlled to 106, 128, and 148 nm. After imprinting and transfer process, cylindrical Si NW is embe...

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